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Method and apparatus for controlling exhaust pressure for extreme ultraviolet generation chamber

A technology of extreme ultraviolet radiation and light source device, which is applied in the direction of exposure device, optics, X-ray equipment, etc.

Active Publication Date: 2020-01-07
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

This process produces metal particles that can contaminate the optics inside the chamber as well as outside the chamber where the EUV radiation is directed

Method used

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  • Method and apparatus for controlling exhaust pressure for extreme ultraviolet generation chamber
  • Method and apparatus for controlling exhaust pressure for extreme ultraviolet generation chamber
  • Method and apparatus for controlling exhaust pressure for extreme ultraviolet generation chamber

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Embodiment Construction

[0065] The following disclosure provides many different embodiments or examples for implementing different features of the presented subject matter. Specific examples of components and configurations are described below to simplify the present disclosure. Of course, these are examples only, not limiting. For example, in the following description, forming a first feature on or over a second feature may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which the first and second features may be formed on or over the second feature. An embodiment in which an additional feature is formed therebetween such that the first feature and the second feature may not be in direct contact. Additionally, the present disclosure may repeat reference numerals and / or words in various instances. This repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodiments an...

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Abstract

An apparatus coupled to a chamber for processing extreme ultraviolet radiation includes a gas inlet configured to direct exhaust gases from the chamber into a combustion zone. The combustion zone is configured to flamelessly ignite the exhaust gases. An air inlet is configured to direct a mixture of air and a fuel into the combustion zone. A control valve is configured to change a volume of fluidexhausted from the combustion zone. A controller configured to control the control valve so as to prevent a pressure inside the combustion zone from exceeding a preset pressure value is provided.

Description

technical field [0001] The present disclosure relates generally to apparatus for producing extreme ultraviolet radiation, and more particularly to methods and apparatus for maintaining exhaust pressure of a chamber for producing extreme ultraviolet radiation. Background technique [0002] EUV lithography is one of the most promising techniques for fabricating integrated circuits (ICs) with smaller feature sizes. One way to generate EUV radiation is laser-excited plasma, in which tiny droplets of a metal, such as tin, are heated to very high temperatures in a chamber using a high-intensity laser beam, such as a carbon dioxide laser. The heat ionizes the tin atoms to form a tin plasma, which emits extreme ultraviolet light as it returns to its ground state. This process produces metal particles that can contaminate the optics inside the chamber as well as outside the chamber where the EUV radiation is directed. One way to reduce metal vapor contamination is by introducing a ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G03F7/20
CPCG03F7/70033F23C99/006F23C2900/99001F23C2900/9901F23G5/50F23G7/06G03F7/70916H05G2/005Y02E20/34F23G5/12F23G7/065F23G2207/101F23G2207/102F23G2207/112F23G2209/141H05G2/008
Inventor 蔡明训李秉承陈彦勳
Owner TAIWAN SEMICON MFG CO LTD