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Extreme ultraviolet radiation light source device and exhaust gas removal method

A technology of extreme ultraviolet radiation and light source device, which is applied in the field of exhaust pressure of the chamber, and can solve the problems of polluting the interior of the chamber and contamination of optical components

Active Publication Date: 2021-07-16
TAIWAN SEMICON MFG CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

This process produces metal particles that can contaminate the optics inside the chamber as well as outside the chamber where the EUV radiation is directed

Method used

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  • Extreme ultraviolet radiation light source device and exhaust gas removal method
  • Extreme ultraviolet radiation light source device and exhaust gas removal method
  • Extreme ultraviolet radiation light source device and exhaust gas removal method

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Embodiment Construction

[0070]The following disclosure provides many different embodiments or examples for implementing different features of the presented subject matter. Specific examples of components and configurations are described below to simplify the present disclosure. Of course, these are examples only, not limiting. For example, in the following description, forming a first feature on or over a second feature may include embodiments in which the first and second features are formed in direct contact, and may also include embodiments in which the first and second features may be formed on or over the second feature. An embodiment in which an additional feature is formed therebetween such that the first feature and the second feature may not be in direct contact. Additionally, the present disclosure may repeat reference numerals and / or words in various instances. This repetition is for simplicity and clarity and does not in itself indicate a relationship between the various embodiments and...

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Abstract

An apparatus coupled to a chamber for processing extreme ultraviolet radiation, an extreme ultraviolet radiation source apparatus, includes a gas inlet configured to direct exhaust from the chamber into a combustion region. The combustion region is configured to flamelessly ignite the exhaust. The air inlet is configured to direct an air and fuel mixture into the combustion zone. The control valve is configured to vary the volume of fluid expelled from the combustion zone. The controller is configured to control the control valve to prevent the pressure in the combustion zone from exceeding a preset pressure value.

Description

technical field [0001] The present disclosure relates generally to apparatus for producing extreme ultraviolet radiation and methods of exhaust removal, and more particularly to methods and apparatus for maintaining exhaust pressure of a chamber producing extreme ultraviolet radiation. Background technique [0002] EUV lithography is one of the most promising techniques for fabricating integrated circuits (ICs) with smaller feature sizes. One way to generate EUV radiation is laser-excited plasma, in which tiny droplets of a metal, such as tin, are heated to very high temperatures in a chamber using a high-intensity laser beam, such as a carbon dioxide laser. The heat ionizes the tin atoms to form a tin plasma, which emits extreme ultraviolet light as it returns to its ground state. This process produces metal particles that can contaminate the optics inside the chamber as well as outside the chamber where the EUV radiation is directed. One way to reduce metal vapor contami...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G03F7/20
CPCG03F7/70033F23C99/006F23C2900/99001F23C2900/9901F23G5/50F23G7/06G03F7/70916H05G2/005Y02E20/34F23G5/12F23G7/065F23G2207/101F23G2207/102F23G2207/112F23G2209/141H05G2/008
Inventor 蔡明训李秉承陈彦勳
Owner TAIWAN SEMICON MFG CO LTD