Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Polishing machine

A technology of polishing machine and polishing mechanism, applied in the field of polishing machine, can solve the problem of inability to trim the thickness of glass

Active Publication Date: 2020-03-20
DONGXU OPTOELECTRONICS TECH CO LTD
View PDF23 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, the existing polishing machine can only perform adaptive polishing on the surface of the glass, that is, the polishing disc can only adjust the angle with the ups and downs of the glass surface, which will cause the problem that the polishing machine cannot trim the thickness of the glass

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Polishing machine
  • Polishing machine
  • Polishing machine

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0020] The specific embodiments of the present invention will be described in detail below with reference to the accompanying drawings. It should be understood that the specific embodiments described herein are only used to illustrate and explain the present invention, and not to limit the present invention.

[0021] Such as Figure 1 ~ Figure 5 As shown, the polishing machine of the present invention includes a polishing mechanism 100 and a supporting mechanism 200 arranged in a vertical direction; wherein the supporting mechanism 200 is configured to drive the supported glass to be polished to move in a horizontal plane, and the polishing mechanism 100 is configured to be in contact with The glass to be polished moving in the horizontal plane is thereby polished. The structure and working principle of the polishing mechanism 100 and the supporting mechanism 200 will be explained separately below.

[0022] Such as figure 2 As shown, the polishing mechanism 100 of the present in...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention discloses a polishing machine. The polishing machine comprises a polishing mechanism (100) and a bearing mechanism (200) which are arranged in the vertical direction, wherein the bearingmechanism (200) is configured to be capable of bearing glass to be polished and enabling the glass to be polished to move in a horizontal plane; the polishing mechanism (100) is arranged to be capable of trimming the thickness of the glass to be polished; the polishing mechanism (100) is provided with a supporting plate (101), a polishing disc and a plurality of adjusting assemblies; the supporting plate (101) is configured to be close to and far away from the glass to be polished; the polishing disc is installed on the supporting plate (101) through the plurality of adjusting assemblies; andthe plurality of adjusting assemblies are configured to be capable of adjusting the inclination angle of the polishing disc relative to the supporting plate (101) and enable the polishing disc to keep the inclination angle. According to the polishing machine, the thickness of glass can be finished when the glass is polished.

Description

Technical field [0001] The invention relates to the technical field of substrate glass polishing, in particular to a polishing machine. Background technique [0002] At present, the substrate glass produced by the float method generally needs to be surface polished to eliminate surface scratches and surface impurities, and reduce surface waviness. For this reason, it is necessary to design a polishing machine to polish the surface of the substrate glass. However, the existing polishing machine can only perform adaptive polishing on the surface of the glass, that is, the polishing disk can only adjust the angle with the fluctuation of the glass surface, which will cause the problem that the polishing machine cannot trim the thickness of the glass. Summary of the invention [0003] The purpose of the present invention is to overcome the problems in the prior art and provide a polishing machine which can trim the thickness of the glass when polishing the glass, and has reliable perfo...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): B24B29/02B24B27/033B24B41/06B24B47/06B24B41/02B24B55/00
CPCB24B27/033B24B29/02B24B41/02B24B41/068B24B47/06B24B55/00
Inventor 李青李赫然廖民安陈发伟张旭李庆文
Owner DONGXU OPTOELECTRONICS TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com