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An Optical Detection Method for High Aspect Ratio Microstructures

An optical detection and aspect ratio micro technology, applied in the direction of using optical devices, measuring devices, instruments, etc., can solve the problem of difficult detection of microstructure sidewalls

Active Publication Date: 2021-07-06
UNIV OF SCI & TECH OF CHINA
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  • Abstract
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Problems solved by technology

[0004] The purpose of the present invention is to propose a microstructure sidewall optical detection method for the problem that the sidewall of the microstructure with a large aspect ratio is difficult to detect

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  • An Optical Detection Method for High Aspect Ratio Microstructures
  • An Optical Detection Method for High Aspect Ratio Microstructures
  • An Optical Detection Method for High Aspect Ratio Microstructures

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Embodiment Construction

[0026] The present invention will be further described below in conjunction with the accompanying drawings and specific embodiments.

[0027] The invention detects the sidewall morphology of the microstructure with a large aspect ratio based on the different reflections of the microstructures of different sidewalls to incident light. Its detection principle is as figure 1 shown.

[0028] figure 1 (a) is a schematic diagram of the optical detection system, figure 1 (b) is a cross-sectional view of the microstructure along the length direction. A beam of incident light is incident along the length direction of the microstructure, and a camera is placed at the light exit position to observe the reflection of the light. The light enters the photoresist from the rightmost point A of the microstructure, reaches the substrate surface and reflects back, and then exits from the B point; the light enters from the C point, and exits from the leftmost point D; After refraction, it rea...

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Abstract

The invention discloses an optical detection method for a microstructure with a large aspect ratio. By observing the different reflections of different microstructures to incident light, the side wall morphology of the microstructure is non-destructively detected, and it is quickly judged whether the microstructure with a large aspect ratio is Tilting or twisting occurs. The invention can perform non-destructive detection on the side wall morphology of photoresist and metal microstructure, and can also perform nondestructive detection on the microstructure side wall morphology in which photoresist and metal coexist. The image collected in the present invention is a high-contrast image, combined with the fast scanning of the sample workbench, the fast detection of large-sized samples can be realized. The invention can detect the samples in the technological process, and can realize the in-situ working condition detection of the samples. In the present invention, the detection accuracy of the side wall inclination is related to the selected objective lens. The higher the magnification of the objective lens, the higher the detection accuracy of the side wall inclination can be provided. Usually, the detection accuracy of the side wall inclination can be 0.1°.

Description

technical field [0001] The invention relates to a detection technology for micro-nano processing, in particular to an optical detection method for a microstructure with a large aspect ratio. Background technique [0002] Microstructures with large aspect ratios have many important applications, such as optical components for X-ray imaging, inertial devices for acceleration measurement, etc., and are widely used in medical, military and aerospace fields. The performance of these components is closely related to the aspect ratio of their microstructures. Like gratings used for X-ray imaging, to meet the imaging requirements of high-energy X-rays, the gratings are required to have a micron structure with a large aspect ratio. Generally, the larger the aspect ratio of the microstructures contained in these components, the better the device performance. Therefore, in order to improve device performance, the fabrication of microstructures with large aspect ratios is very importan...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): G01B11/24
CPCG01B11/24
Inventor 刘刚魏文彬熊瑛侯双月田扬超
Owner UNIV OF SCI & TECH OF CHINA
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