Optical detection method for microstructure with large aspect ratio

Abstract

The invention discloses an optical detection method for a microstructure with a large depth-to-width ratio, and the method achieves the nondestructive detection of the side wall morphology of the microstructure through observing the different reflection conditions of different microstructures for incident light, and quickly judges whether the microstructure with the large depth-to-width ratio inclines and distorts. According to the method, nondestructive testing can be carried out on the side wall morphology of the photoresist and the metal microstructure, and nondestructive testing can also be carried out on the side wall morphology of the microstructure where the photoresist and the metal coexist. According to the method, a high-contrast image is acquired, and rapid detection of a large-size sample can be realized in combination with rapid scanning of the sample workbench. According to the method, a sample in the technological process can be detected, and in-situ working condition detection of the sample can be realized. The side wall inclination angle detection precision is related to the selected objective lens, the higher the magnification times of the objective lens are, thehigher the side wall inclination angle detection precision can be provided, and generally, the 0.1-degree side wall inclination angle detection precision can be achieved.

Description

technical field [0001] The invention relates to a detection technology for micro-nano processing, in particular to an optical detection method for a microstructure with a large aspect ratio. Background technique [0002] Microstructures with large aspect ratios have many important applications, such as optical components for X-ray imaging, inertial devices for acceleration measurement, etc., and are widely used in medical, military and aerospace fields. The performance of these components is closely related to the aspect ratio of their microstructures. Like gratings used for X-ray imaging, to meet the imaging requirements of high-energy X-rays, the gratings are required to have a micron structure with a large aspect ratio. Generally, the larger the aspect ratio of the microstructures contained in these components, the better the device performance. Therefore, in order to improve device performance, the fabrication of microstructures with large aspect ratios is very importan...

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to propose a microstructure sidewall optical detection method for the problem that the sidewall of the microstructure with a large aspect ratio is difficult to detect

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