Topological bulk laser based on energy band inversion light field limiting effect and method
A technology of lasers and topological states, which is applied in the field of topological lasers and their control, and can solve problems such as laser brightness reduction, single tube, and difficulty in electrical injection into the active layer of the preparation process.
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Embodiment 1
[0037] Such as figure 1 As shown, the present embodiment adopts optical pump excitation, and the topological body state laser based on the energy band inversion light field confinement effect includes: topological state photonic crystal and topological mediocre state photonic crystal, using two-dimensional topological photonic crystal; Layer 2, construct topological photonic crystals and topological mediocre photonic crystals, the material of the active layer is a multilayer quantum well structure (such as InGaAsP / InGaAs) grown on the semiconductor substrate 1 (such as InP) by epitaxy, by changing The elements and element components of the active layer material have an optional refractive index between 2.5 and -3.5; the topological mediocre photonic crystal 31 and the topological photonic crystal 32 are spliced together to form a boundary at the splicing place; the boundary is bent, And surround it into a closed curve, so that the laser resonator is formed inside the boundar...
Embodiment 2
[0047] Such as Figure 12 As shown, this embodiment adopts electric injection vertical surface emitting topological bulk laser. By duplicating the two-dimensional topological photonic crystal in Example 1 into the electrical injection active layer, a practical new electrical injection vertical plane with controllable size, high directivity, low threshold, narrow line width, and high side mode suppression ratio can be obtained. Fire the laser. Its structure includes: an epitaxial layer, the epitaxial layer includes: N-type substrate 6; N-type contact layer 7, located on the N-type substrate; N-type confinement layer 8; active layer 2, located on the N-type confinement layer On; P-type confinement layer 9, located on the active layer; P-type contact layer 10, located on the P-type confinement layer. Wherein, the refractive index of the material of the N surface and the P surface is slightly smaller than that of the active layer, and the refractive index difference is optional ...
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