Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High-pressure-and-low-pressure manufacturing device

A high-low-pressure, high-pressure technology, applied in the direction of pump devices, liquid displacement machinery, variable displacement pump components, etc., can solve problems such as inability to adapt, small pressure difference, large pressure difference, etc., to prevent threats and achieve high efficiency , The effect of large pressure difference between high and low pressure

Inactive Publication Date: 2020-05-08
李仕清
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] At present, on the one hand, it is difficult for people to unify equipment for vacuuming or increasing air pressure;

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-pressure-and-low-pressure manufacturing device
  • High-pressure-and-low-pressure manufacturing device
  • High-pressure-and-low-pressure manufacturing device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment approach 1

[0047] Such as figure 1 As shown, a high and low pressure pressing device 1 according to the first embodiment of the present invention, the present invention is a high and low pressure pressing device 1 composed of a pressing shell 6, which is a device for manufacturing a low pressure space or a high pressure space , the pressing body 7 of the high and low pressure pressing device 1 reciprocates axially along the hole wall inside the pressing shell 6 until the space between the pressing body inside the pressing shell 6 and the bottom cover of the pressing shell 6 is the largest and the gas is the most The pressing body 7 compresses the space of the internal gas to form a high air pressure; or the pressing body 7 of the high and low pressure pressing device 1 has the smallest space between the pressing body 7 and the bottom cover of the pressing housing 6 and the least gas The pressure body expands the space of the internal gas to form a low pressure; the following combination ...

Embodiment approach 2

[0085] Such as Figure 2-Figure 3 As shown, a high and low pressure pressing device 1 of the first embodiment of the present invention, on the basis of the first embodiment, the high and low pressure pressing device 1 formed by the combination of two pressing housings 6 of the present invention is used to manufacture low pressure Space or hyperbaric space equipment, figure 1 It is a high and low pressure pressing device 1 with a pressing housing 6, Figure 2-Figure 3 It is a high and low pressure pressing device 1 that is combined with two pressing shells 6; Figure 1-Figure 3 and the brief description of Embodiment 1 to explain Embodiment 2;

[0086] The high and low pressure pressing device 1 of the present invention includes a moving device, a pressing rod 2, a pressing body 7, a pressing housing 6, and a valve. The valve includes a suction valve 11 and a pressurizing valve 15. The high and low pressure pressing device 1 Equipment for the manufacture of spaces of low or ...

Embodiment approach 3

[0105] Such as Figure 2-Figure 3 Shown, a kind of high and low pressure pressing device 1 of the first embodiment of the present invention, on the basis of the first - second embodiment, the present invention is used to manufacture the equipment for the space of low pressure, normal pressure and high pressure cycle change, figure 1 It is a high and low pressure pressing device 1 provided with a pressing housing 6, Figure 2-Figure 3 It is a high and low pressure pressing device 1 in which two pressing shells 6 are set together; the following combination Figure 1-3 and the brief description of Embodiment 1-2 to explain Embodiment 3;

[0106] The high and low pressure pressing device 1 of the present invention comprises a moving device, a pressing rod 2, a pressing body 7, a pressing housing 6, and a valve, and the valve includes a suction valve 11 and a pressurizing valve 15. 1 Manufacture of all equipment employing hyperbaric or hypobaric spaces,

[0107] In the third emb...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to a high-pressure-and-low-pressure manufacturing device. The high-pressure-and-low-pressure manufacturing device is composed of a movement device, a pressure manufacturing rod,a pressure manufacturing body, a pressure manufacturing shell and a valve. The valve comprises a pressure suction valve and a pressurization valve, by changing space chambers of external devices connected with the pressure suction valve and the pressurization valve of the high-pressure-and-low-pressure manufacturing device, the conversion of high air pressure or low air pressure in the space chambers of the external devices can be changed, the pressurization valve for manufacturing air pressure higher than that of the atmospheric environment and the pressure suction valve for manufacturing airpressure lower than that of the atmospheric environment are arranged at the outer periphery edge of the bottom of each pressure manufacturing shell of the high-pressure-and-low-pressure manufacturingdevice integrally or in an integrally-connected-and-formed mode, and at least one end of the pressure suction valve or the pressurization valve of the high-pressure-and-low-pressure manufacturing device is connected with space chambers of the various devices through a control valve and a pipeline to manufacture low-air-pressure space chambers with air pressure lower than that of the atmospheric environment or high-air-pressure space chambers with air pressure higher than that of the atmospheric environment.

Description

Technical field: [0001] The invention relates to a high-low pressure pressing device, which is used to create a high-pressure or low-pressure space. Background technique: [0002] At present, on the one hand, it is difficult for people to unify the equipment for vacuuming or increasing the pressure. On the other hand, the pressure difference is too small and the efficiency is too low to meet the needs of rapid low or high pressure and large pressure difference. Invention content: [0003] The present invention is proposed in view of the above-mentioned problems, and aims to provide a safe high-low pressure device, which can create a low-pressure or high-pressure space environment in a fast, efficient and energy-saving manner. [0004] In order to achieve the above object, the present invention adopts following technical scheme: [0005] A high and low pressure pressing device, comprising a high and low pressure pressing device composed of a moving device, a pressing rod, ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): F04B41/00F04B39/10F04B39/08
CPCF04B39/08F04B39/102F04B41/00
Inventor 不公告发明人
Owner 李仕清
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com