Efficient nanometer vacuum evaporation source

A technology of vacuum evaporation and evaporation source, which is applied in the direction of vacuum evaporation plating, ion implantation plating, metal material coating process, etc., to achieve the effect of rotating and cleaning, reducing the scattering area, and ensuring the efficiency of evaporation

Inactive Publication Date: 2020-05-29
苏州泓沵达仪器科技有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] In order to overcome the above disadvantages, the object of the present invention is to provide a high-efficiency nano-vacuum evaporation source, which reduces the scattering surface without affecting the capacity of the crucible, reduces the waste rate of source materials, and effectively avoids the clogging of the opening, ensuring Evaporation efficiency of the source material

Method used

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  • Efficient nanometer vacuum evaporation source
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  • Efficient nanometer vacuum evaporation source

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Embodiment

[0022] See attached Figure 1-5 As shown, a high-efficiency nano-vacuum evaporation source of the present invention includes a heat shield assembly 1 with an open top, the bottom of the heat shield assembly 1 is connected to a vacuum flange 2, and a crucible assembly for loading source materials is provided inside . The crucible assembly includes a U-shaped crucible 3, a No. 1 heating assembly 4 is wound around the outer wall of the U-shaped crucible 3, and a cover plate 5 integrally formed with it is provided on the top of the U-shaped crucible 3. The middle part of the cover plate 5 is provided with an evaporation opening 51 , and the top of the cover plate 5 is provided with a rotatable top cover 6 . The upper end of the top cover 6 is connected to the driving element fixedly connected to the heat shield assembly 1 , and a through hole matching the evaporation opening 51 is provided in the middle. A cleaning piece for cleaning the evaporation opening 51 is provided in the...

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Abstract

The invention discloses a high-efficiency nano vacuum evaporation source. The high-efficiency nano vacuum evaporation source comprises a heat shielding assembly with an open top end, the bottom of theheat shielding assembly is connected with a vacuum flange, and a crucible assembly used for loading a source material is arranged in the heat shielding assembly; the crucible assembly comprises a U-shaped crucible, and a cover plate integrally formed with the U-shaped crucible is arranged at the top of the U-shaped crucible; an evaporation opening is formed in the middle of the cover plate, and atop cover capable of rotating relative to the cover plate is arranged at the top of the cover plate; the upper end of the top cover is connected with a driving piece fixedly connected to the heat shielding assembly, and a through hole matched with the evaporation opening is formed in the middle of the top cover; and a cleaning piece for cleaning the evaporation opening is arranged in the throughhole. According to the nano vacuum evaporation source, the scattering surface is reduced on the premise that the capacity of the crucible is not influenced, the waste rate of source materials is reduced, the blocking phenomenon of the opening is effectively avoided, and the evaporation efficiency of the source materials is guaranteed.

Description

technical field [0001] The invention relates to the technical field of vacuum coating, in particular to a high-efficiency nanometer vacuum evaporation source. Background technique [0002] The nano-vacuum evaporation source is the core component of the nano-vacuum coating equipment, which can realize the nano-level high-precision control of the source material. The crucible (i.e., the container used to load the source material) of the nano-vacuum evaporation source commonly used in the market is U-shaped, but the U-shaped opening is completely open and has a large diameter, so the scattering surface is large. Sometimes, a considerable part of the nanomaterials cannot be collected by the substrate, but are deposited in other positions other than the substrate, resulting in a high waste rate of materials. If the crucible is made into a conical structure, although the scattering surface can be reduced by reducing the aperture, the capacity of the crucible will be reduced, whic...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): C23C14/24
CPCC23C14/24
Inventor 王宁
Owner 苏州泓沵达仪器科技有限公司
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