Unlock instant, AI-driven research and patent intelligence for your innovation.

Optical member and producing method of optical member

A technology for optical components and manufacturing methods, applied in optical elements, optics, vehicle parts, etc., can solve problems such as difficulty, layer thickness does not become uniform, limited materials, etc., to achieve excellent salt water resistance and improve dissolution and peeling properties. Effect

Inactive Publication Date: 2020-06-02
KONICA MINOLTA INC
View PDF10 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0009] However, if the vapor deposition method using the above-mentioned IAD method is applied to the formation of an extremely thin film required for the above-mentioned uppermost layer, the layer thickness in the circumferential direction of the device will not become uniform.
In addition, when the material of the uppermost layer is a mixture, there is a problem that the vapor pressure approach is limited to a material, and it is difficult to form the uppermost layer with a desired material ratio and layer thickness.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Optical member and producing method of optical member
  • Optical member and producing method of optical member
  • Optical member and producing method of optical member

Examples

Experimental program
Comparison scheme
Effect test

no. 1 Embodiment approach

[0144]

[0145] Figure 4 It is a schematic diagram of an ion beam sputtering film forming apparatus that sputters with an ion beam irradiated from an ion source according to the present invention. However, this figure is an example and is not limited thereto.

[0146] The ion beam sputtering film forming device 50 and image 3 Similarly, the IAD vapor deposition apparatus provided in the chamber 2 includes a dome 3 , and the substrate 4 is arranged along the dome 3 .

[0147] The sputtering source is the IAD ion source 7 , and the first sputtering target 52 and the second sputtering target 53 are irradiated with the ion beam 8 irradiated from the IAD ion source 7 . exist Figure 4 In , the case where binary sputtering is performed is described, but one type of sputtering target may be used.

[0148] As for the first sputtering target 52 and the second sputtering target 53, they are disposed on the target holder 51 between the substrate 4 and the IAD ion source 7. For th...

no. 2 Embodiment approach

[0174]

[0175] Figure 7 It is a schematic diagram showing an example of a film forming apparatus including an IAD vapor deposition apparatus and an ion beam sputtering apparatus capable of continuously forming a dielectric multilayer film as a lower layer and an uppermost layer according to the present invention.

[0176] In terms of the film forming device 90, with image 3Similarly, the IAD vapor deposition apparatus provided in the chamber 2 includes a dome 3 , and the substrate 4 is arranged along the dome 3 . Evaporation source 5 is provided with an electron gun for evaporating the vapor deposition substance. Evaporation substance 6 is scattered from vapor deposition source 5 to substrate 4 and condenses and solidifies on substrate 4 . At this time, the substrate is irradiated with an ion beam 8 from the IAD ion source 7, and the high kinetic energy of the ions is exerted during film formation to form a dense film or improve the adhesive force of the film.

[0177] ...

Embodiment

[0189] Hereinafter, although an Example is given and this invention is demonstrated concretely, this invention is not limited to these. In addition, the expression of "part" or "%" is used in an Example, Unless otherwise specified, it means "part by mass" or "% by mass".

[0190]

[0191] use Figure 7 In the film formation apparatus shown in , the deposition by the IAD method and the sputtering film formation using the IAD ion source were performed under the following conditions. The film-forming materials used in Examples are as follows.

[0192] 〈Film-forming material〉

[0193] SiO 2 : Merck company product name SIO 2

[0194] Ta 2 o 5 : Canon Optran Co., Ltd. product name A600

[0195] TiO 2 : Product name Ti made by Fuji Chitan Co., Ltd. 3 o 5

[0196] MgF 2 : Merck company trade name MgF 2

[0197] al 2 o 3 : Merck company trade name Al 2 o 3

[0198] SUS304: stainless steel

[0199]

[0200] Glass base board

[0201]

[0202] (chamber conditi...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
thicknessaaaaaaaaaa
Login to View More

Abstract

The object of the present invention is to provide an optical member with excellent salt water resistance and its manufacturing method, which is realized by improving dissolution peelability caused bythe uppermost layer salt water containing containing SiO2 as the main component without the influence of the time on the spectral reflectance of the lower layer, and the occurrence of ghosts and glareassociated therewith. Disclosed is an optical member including dielectric multilayer films on a substrate, wherein an immediately lower layer of an uppermost layer is a layer containing any one of SiO2, MgF2and Al2O3, or a mixture of any combination of SiO2, MgF2and Al2O3; and the uppermost layer is a metal oxide layer containing SiO2 as a main component and also containing at least one of Cr andTi.

Description

technical field [0001] The present invention relates to an optical component and a method for manufacturing the optical component, and more specifically, relates to improving 2 Dissolution and detachment by the salt water of the uppermost layer as the main component does not affect the spectral reflectance of the lower layer due to environmental degradation, ghosts and glare accompanying it, and is excellent in salt water resistance Optical components, etc. Background technique [0002] In order to assist the driving of the vehicle, a camera is mounted on the vehicle. More specifically, mounting a camera on the body of a car that captures the rear and sides of the vehicle, and displaying the image captured by the camera in a position where the driver can see reduces blind spots, thereby contributing to safe driving . [0003] In most cases, the vehicle-mounted camera is installed outside the vehicle, and the lens used is strictly required to ensure the environmental resis...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G02B1/115
CPCG02B1/115C23C14/0694C23C14/08C23C14/10C23C14/30C23C14/34G02B1/14G02B1/18B60R11/04B60R2011/004C03C17/3452C03C2217/212C03C2217/213C03C2217/214C03C2217/285C03C2217/734C03C2218/156G02B27/0018
Inventor 能势正章
Owner KONICA MINOLTA INC