Template transfer printing method

Abstract

The invention discloses a template transfer printing method which comprises the steps that a bearing piece is provided, the bearing piece comprises a base plate and a baffle connected with the peripheral side of the base plate, and a containing groove is defined by the base plate and the baffle; a female die plate is placed in a containing groove, the transfer printing face of the female die plateis attached to the base plate, and the transfer printing face comprises a main area with a preset graph and a secondary area surrounding the main area; a liquid material is injected into the accommodating groove, and the liquid material is cured to form a solid material; a bearing part is removed, and solid material is removed on the transfer surface to obtain a to-be-transferred template; and asoft template is formed on the surface, with the preset pattern, of the to-be-transferred template, and removing the to-be-transferred template to obtain a soft template. According to the invention,the female template is processed into the to-be-transferred template, the to-be-transferred template overcomes the defect structure of the secondary area of the female template, and the soft templatetransferred by the to-be-transferred template is used, so that the imprinting quality can be effectively improved.

Description

technical field [0001] The present invention generally relates to embossing technology, in particular to a template transfer printing method. Background technique [0002] Nanoimprinting technology (NIL) is a new type of micro-nano processing technology, which achieves ultra-high resolution through mechanical transfer. It is expected to replace traditional lithography technology in the future and become an important processing method in the field of microelectronics and materials. . [0003] At present, due to the gradual development of display substrates from small to large sizes, correspondingly, large-sized nanoimprint templates are required. However, the production of existing nanoimprint templates is completed by electroforming or electron beam direct writing technology, which takes a long time. Generally, the nanoimprint templates produced are small in size, and it is difficult to directly manufacture large-scale nanoimprint templates. Large-size nanoimprint template...

AI Technical Summary

Problems solved by technology

However, the production of existing nanoimprint templates is completed by electroforming or electron beam direct writing technology, which takes a long time. Generally, the nanoimprint templates produced are small in size, and it is difficult to directly manufacture large-scale nanoimprint templates. Large-size nanoimprint templates are currently spliced ​​by multiple imprinted patterns of small-size (such as 8in) nanoimprint templates. The small-size nanoimprint templates are soft templates printed from silicon wafers

[0004] During the reprinting process, due to the laser cutting technology and the chamfering of the silicon wafer, there will be a step difference around the silicon wafer, which will cause barb defects on the reprinted soft template, which will affect the imprinting quality

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