Chamfering mechanism capable of eliminating deviation

A technology of chamfering mechanism and deviation, applied in the field of chamfering mechanism, can solve the problems of easy deviation, easy generation of burrs, poor chamfering effect, etc., so as to eliminate concentricity deviation and height deviation, improve production efficiency and reduce production cost. Effect

Pending Publication Date: 2020-06-30
XIAMEN YOUXIN INFORMATION TECH CO LTD
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The present invention aims to solve the problem that the existing chamfering method is prone to deviation, which makes it easy to generate new burrs, and the chamfering effect is poor

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Chamfering mechanism capable of eliminating deviation
  • Chamfering mechanism capable of eliminating deviation
  • Chamfering mechanism capable of eliminating deviation

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0025] The existing chamfering method is prone to deviation, which makes it easy to generate new burrs, and the chamfering effect is poor. Therefore, the present invention proposes a new solution. For a clearer representation, the present invention will be described in detail below in conjunction with the accompanying drawings.

[0026] see Figure 1-4 , a chamfering mechanism that can eliminate deviations, including a frame, the frame includes a base 1, a mounting base 2 and a support assembly 3, the mounting base 2 is fixedly erected in the middle of the base 1, and the support assembly 3 It is fixedly arranged at the rear end of the base 1 .

[0027] The mounting base 2 is provided with at least one rotating jig 4 for installing the product to be processed, and the base 1 is fixed with a first driving device 5 for driving the rotating jig 4 to rotate.

[0028] A floating cutter assembly 6 corresponding to the rotary jig 4 is slidably mounted on the support assembly 3, and...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The invention provides a chamfering mechanism capable of eliminating deviation. The chamfering mechanism comprises a rack, wherein the rack comprises a base, a mounting base and a supporting assembly,wherein at least one rotary jig used for mounting a to-be-processed product is arranged on the mounting base; a first drive device for driving the rotary jig to rotate is arranged on the base; a floating tool assembly which corresponds to the rotary jig is slidably connected on the supporting assembly; a second drive device for pushing the floating tool assembly is further arranged on the supporting assembly; the floating tool assembly is provided with a floating regulating part, a clamping device and a chamfering knife; the floating regulating part is provided with an X-axis regulating assembly, a Y-axis regulating assembly and a Z-axis regulating assembly; the clamping device is mounted on the floating regulating part; and the chamfering knife is mounted in the clamping device. The chamfering mechanism can eliminate concentricity deviation and height deviation during chamfering, guarantees chamfering effect, and improves production efficiency.

Description

technical field [0001] The invention relates to the technical field of gate chamfering of circular engineering plastic parts, in particular to a chamfering mechanism capable of eliminating deviation. Background technique [0002] With the development of industry, more and more plastic products are born. Many products are injection molded by engineering plastics. The gates of injection molded products often have burrs, parting lines and gate residues. The blank parts of this engineering plastics It is necessary to chamfer to remove these burrs before proceeding to the next step of side production. At this stage, the chamfering method of engineering plastic injection molded parts is generally to drive the chamfering tool to chamfer the product through the electric spindle. In this way, there is easy deviation between the chamfering tool and the product, and it is easy to generate new burr efficiency during chamfering. Low, and not conducive to the removal of product follow-up...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): B29C45/38
CPCB29C45/382
Inventor 钟文鸣林松华杨明
Owner XIAMEN YOUXIN INFORMATION TECH CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products