General moisturizing mask liquid

A technology of film liquid and leaf extract, which is applied in the field of skin care products, can solve the problems of less masks and insufficient effects, and achieve the effects of improving skin elasticity, improving skin quality, and rich sources of raw materials

Inactive Publication Date: 2020-07-17
广州怡嘉生物科技有限公司
View PDF3 Cites 7 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The purpose of the present invention is to provide the public with an agent that does not contain chemical additives, and has the functions of moisturizing, soothing the skin, improving the absorption of subsequent nutrition and skin care products, eliminating spots, whitening, and eliminating powder. In beauty and skin care products, facial masks belong to A skin care product that needs to be used frequently, but at present, there are few masks on the market for skin repair, and the effect is not sufficient. Therefore, we designed a universal moisturizing mask liquid

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0011] This application provides a general moisturizing facial mask liquid, including water, propylene glycol, caprylyl hydroxamic acid, glycerin caprylate, licorice glabra (GLYCYRRHIZA GLABRA) root extract, chamomile (CHAMOMILLA RECUTITA) leaf extract, knotweed ( POLYGONUM CUSPIDATUM) extract, Centella Asiatica (CENTELLA ASIATICA) extract, tea (CAMELLIASINENSIS) leaf extract, scutellaria baicalensis (SCUTELLARIA BAICALENSIS) root extract, rosemary (ROSMARINUSOFFICINALIS) leaf extract, phenoxyethanol, caprylyl glycol , carbomer, sodium hyaluronate, methylparaben, hydroxyethylcellulose; among them, 1-50 parts of water, 1-20 parts of propylene glycol, 1-20 parts of caprylyl hydroxamic acid, and 1 part of caprylic acid -20 parts, GLYCYRRHIZA GLABRA root extract 1-10 parts, chamomile (CHAMOMILLA RECUTITA) leaf extract 1-10 parts, knotweed (POLYGONUM CUSPIDATUM) extract 1-10 parts, Centella asiatica (CENTELLA ASIATICA) extract 0.1-10 parts, tea (CAMELLIA SINNSIS) leaf extract 1-10 ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The embodiment of the invention discloses a general moisturizing mask liquid. The mask liquid comprises water, propylene glycol, caprylhydroxamic acid, glycerol caprylate, a glycyrrhiza glabra root extract, a chamomilla recurutita leaf extract, a polygonum cuspidatum extract, a centella asiatica extract, a camellia sinnensis leaf extract, a scutellaria baicalensis root extract, a rosmarinus officinalis leaf extract, phenoxyethanol, caprylyl glycol, carbomer, sodium hyaluronate, methylparaben and hydroxyethyl cellulose. The mask liquid contains various plant extraction essences, is moist but not greasy, instantaneously permeates into and is adsorbed on the lipid part of the skin, and can better moisturize cuticle, and permeate and nourish the delicate skin. The skin sensitivity problem is relieved, and the skin roughness and dryness problem is finely repaired. Skin sagging is reduced and prevented, skin compactness loss and skin elasticity loss are avoided, and skin oxidation resistanceis achieved for a long time.

Description

technical field [0001] The invention relates to the field of skin care products, in particular to a general moisturizing facial mask liquid. Background technique [0002] With the continuous improvement of living standards, people pay more and more attention to their appearance and image after satisfying the problem of food and clothing, and the requirements for skin care products are also getting higher and higher. Use skin care products to change your own skin, such as thinning the skin, increasing the tension and elasticity of the skin, etc. However, most of the existing beauty cosmetics contain many chemical ingredients, which will have a certain stimulating effect on human skin, especially some chemical synthetic products also contain lead, alcohol, lemon oil, pigments, preservatives, etc. Not only is it extremely unfavorable to people's health, but it can also cause skin relaxation, edema, thin cuticle, and allergies, etc. In particular, active ingredients are general...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61Q19/00A61Q19/08A61Q19/02
CPCA61K8/9789A61Q19/00A61Q19/08A61Q19/005A61Q19/02
Inventor 余华
Owner 广州怡嘉生物科技有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products