Liquid discharging device, filtering system and semiconductor processing equipment

Abstract

The invention provides a liquid discharging device, a filtering system and semiconductor processing equipment, and belongs to the technical field of semiconductor processing. The liquid discharging device comprises a siphon and a guide pipe; the siphon is provided with a liquid outlet, a first liquid inlet and a second liquid inlet communicated with the first liquid inlet and the liquid outlet respectively, the guide pipe is communicated with the second liquid inlet, and when the liquid outlet is subjected to suction force, a pressure difference is formed between the first liquid inlet and thesecond liquid inlet so as to form siphon force at the second liquid inlet; and the guide pipe guides the to-be-filtered liquid under the action of siphon force, and then the to-be-filtered liquid enters the second liquid inlet and is discharged through the liquid outlet. According to the liquid discharging device provided by the invention, to-be-filtered liquid can flow into the siphon in a directional manner; the liquid to be filtered is effectively prevented from forming turbulent flow without a fixed flow direction, so that the to-be-filtered liquid effectively enters a subsequent circulating filtration system, the liquid discharge efficiency and the removal rate of reactants in the to-be-filtered liquid are improved, and the treatment effect of the semiconductor treatment equipment isfurther improved.

Description

technical field [0001] The invention belongs to the technical field of semiconductor processing, and in particular relates to a liquid discharge device, a filtering system and a semiconductor processing equipment. Background technique [0002] At present, the etching process in the semiconductor manufacturing industry uses chemical etching machines. After chemical etching, reactants will be suspended in the chemical solution. If the reactants are not removed, they will adhere to the surface of the product and affect the etching effect. . [0003] However, the main groove etching machines in the industry have an inner and outer groove structure and an open groove body structure. For an etching machine with an inner and outer groove structure, the overflow of the inner groove - the outflow of the outer groove - the circulating pump - the filtration of the filter barrel - The reactant is removed by the circulation filtration method entering the inner tank, that is, the reactan...

AI Technical Summary

Problems solved by technology

However, for an etching machine with an open tank structure, it cannot effectively remove reactants

In addition, for other monolithic etching machines, the circulating filtration method is that the liquid medicine enters from the top of the tank - flows out from the bottom of the tank - circulation pump - filter barrel filter - enters the tank, and the liquid in the tank will appear irregular Flow direction, which is easy to form turbulent flow, so that the reactants cannot effectively enter the circulating filtration system

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