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A kind of production process method of high-purity gallium grain

A production process and high-purity technology, applied in the field of high-purity gallium, can solve the problems of high cost and difficulty of high-purity gallium grains, and achieve the effect of simple preparation method, inhibition of oxidation reaction, and improvement of the purity of gallium grains

Active Publication Date: 2021-07-06
楚雄川至电子材料有限公司
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] The purpose of the present invention is to overcome the difficulty and high cost of high-purity gallium grains in the prior art, and provide a production process for high-purity gallium grains, which uses common water as a coolant and prepares gallium with uniform particle diameters at room temperature. High-purity gallium particles, simple preparation method

Method used

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  • A kind of production process method of high-purity gallium grain
  • A kind of production process method of high-purity gallium grain
  • A kind of production process method of high-purity gallium grain

Examples

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Effect test

Embodiment 1

[0024] A method for producing high-purity gallium grains, comprising the steps of:

[0025] S1. Add concentrated hydrochloric acid to the deionized water exchange water to obtain a coolant; melt the high-purity gallium raw material into a liquid state, and put it into a drip bottle; preferably, the resistivity of the deionized water is greater than 16 megohms, and the concentrated hydrochloric acid is exchanged with deionized The volume ratio of water is 1:200; preferably, the melting temperature of the high-purity gallium raw material is 45-55°C, most preferably, the melting temperature of the high-purity gallium raw material is 50°C;

[0026] S2. Place the opening of the dripping bottle in the coolant, the temperature of the coolant is 5-15°C, start dripping, move the dripping bottle horizontally at a speed of 3-9cm / s during the dripping process, the liquid is high-purity The gallium raw material is solidified into high-purity gallium particles after being dropped into the c...

Embodiment 2

[0047] On the basis of Embodiment 1, this embodiment further includes: the height of the liquid high-purity gallium raw material dropping to the bottom of the coolant after being dropped into the coolant is greater than or equal to 25 cm. After researching the production process provided in this example, the inventor found that when the liquid high-purity gallium raw material drops into the coolant during the dropping process and the height of the drop to the bottom of the coolant is too low, the obtained high-purity gallium grains are prone to abnormal shapes. Particles reduce the uniformity of high-purity gallium particles, see Table 4 below for details:

[0048] Table 4 Effect of drop height on high-purity gallium grains

[0049]

[0050] Note: The uniformity in the above table refers to the content of gallium grains with a particle size of ±0.5mm that accounts for the most in the obtained high-purity gallium grains.

[0051] It can be seen from the above table that whe...

Embodiment 3

[0053] On the basis of Example 1, this embodiment further includes: the opening diameter of the drip opening of the drip bottle is 0.6-2.6 mm, and high-purity gallium particles with a particle size of 1 mm-10 mm are prepared. Preferably, when the opening aperture of the dripping bottle is 0.8 ± 0.2 mm, high-purity gallium particles with a particle size of 1 to 2 mm are prepared; when the opening aperture of the dripping bottle is 1.2 ± 0.2 mm When the particle size is 0.2mm, high-purity gallium particles with a particle size of 2mm to 3mm can be prepared; when the opening diameter of the drop opening of the dripping bottle is 1.6±0.2mm, high-purity gallium particles with a particle size of 3mm to 5mm can be prepared grains; when the opening diameter of the dripping mouth of the dripping bottle is 2±0.2mm, high-purity gallium grains with a particle size of 5mm to 7mm are prepared; when the opening diameter of the dripping opening of the dripping bottle is 2.4±0.2mm mm, high-pur...

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Abstract

The invention discloses a production process of high-purity gallium particles, which comprises the following steps: S1, adding concentrated hydrochloric acid into deionized water exchange water to obtain a coolant; melting the high-purity gallium raw material into a liquid state, and putting it into a dripping bottle; S2 . Submerge the opening of the dripping bottle and place it under the water surface of the coolant. The temperature of the coolant is 5-15°C. Start dripping. During the dripping process, move the dripping bottle horizontally at a speed of 3-9cm / s. The liquid high-purity gallium raw material is solidified into high-purity gallium particles after being dripped into the coolant; the particle size of the prepared high-purity gallium particles is controlled by adjusting the aperture size of the drop opening of the drip bottle; S3, collecting high-purity gallium Rinse the high-purity gallium pellets with deionized water at 10-20°C until neutral; S4. Spread the rinsed high-purity gallium pellets in a drying oven for drying at a drying temperature of 13-23°C. Compared with the prior art, the method provided by the invention uses common water as a coolant to prepare high-purity gallium particles with uniform particle size at room temperature, and the preparation method is simple.

Description

technical field [0001] The invention relates to the field of high-purity gallium, in particular to a production process method of high-purity gallium grains. Background technique [0002] Gallium is a light blue metal that turns into a silvery white liquid at a temperature of 29.76°C. Liquid gallium is very easy to be supercooled, that is, cooled to 0°C without solidification, and the volume of gallium will increase by nearly 3.2% during the process of changing from liquid to solid. High-purity gallium is an important semiconductor basic material. With its series of compounds such as gallium arsenide, gallium phosphide, and gallium aluminum arsenide widely used in high-speed integrated circuits, LEDs, photosensitive elements, photovoltaic solar cells and other fields, high-purity gallium The market demand for gallium is increasing rapidly. Especially in the photovoltaic solar cell industry and other industries that require the use of high-purity gallium as a convenient ing...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): B22F9/06
CPCB22F9/06
Inventor 曹昌威
Owner 楚雄川至电子材料有限公司
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