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High-dimensional multi-objective optimization design method for optical film

An objective optimization, optical thin film technology, applied in multi-objective optimization, design optimization/simulation, calculation, etc., can solve problems such as difficult to obtain the optimal non-dominated solution frontier of high-dimensional multi-objective problems, and the reduction of algorithm solution efficiency. Coating risk, strong applicability, and the effect of improving coating yield

Active Publication Date: 2020-09-29
长春国科精密光学技术有限公司
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  • Application Information

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Problems solved by technology

However, taking a typical multi-objective optimization algorithm as an example, it is more successful in solving dual-objective problems. When the object dimension increases to three-dimensional or higher, the algorithm’s solution efficiency is greatly reduced, and it is difficult to obtain the optimal non-dominated solution frontier

Method used

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  • High-dimensional multi-objective optimization design method for optical film
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  • High-dimensional multi-objective optimization design method for optical film

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Embodiment 1

[0161] Embodiment 1 In this embodiment, a wide-angle high-reflectivity Mo / Si multilayer film system is designed, and the optical path and film structure of the element are shown in Figure 2(a) and Figure 2(b) respectively. combine figure 1 Further explain the implementation steps of the combination of high-dimensional multi-objective genetic algorithm and direction-selective high-dimensional multi-objective genetic algorithm for the design of wide-angle high reflectivity Mo / Si multilayer films. The specific steps are as follows:

[0162] Step I: Wide-angle high-reflectivity Mo / Si multilayer film system design based on high-dimensional multi-objective genetic algorithm

[0163] (1.1) Input the initial parameter values ​​of wide-angle Mo / Si multilayer film system design, including population size N, variation probability p m , crossover operator η c , mutation operator η p , the evolution algebra j, the optimized design film layer number t and the optimal search range of the ...

Embodiment 2

[0236] Embodiment 2: In this embodiment, the wide-spectrum beam splitting Mo / Si multilayer film system is designed, and the specific optical path and film structure are shown in Fig. 6(a) and Fig. 6(b) respectively. combine figure 1 Further explain the implementation steps of combining high-dimensional multi-objective genetic algorithm and direction-selective high-dimensional multi-objective genetic algorithm for the design of wide-spectrum beam-splitting Mo / Si multilayer films, as follows:

[0237] Step I: Wide Spectrum Beam-Splitting Mo / Si Multilayer Film System Design Based on High-Dimensional Multi-objective Genetic Algorithm

[0238] (1.1) Input the initial parameter values ​​of wide spectrum beam splitting Mo / Si multilayer film system design, including population size N, variation probability p m , crossover operator η c , mutation operator η p , the evolution algebra j, the optimally designed film layer number t, and the optimal search range for the geometric thickne...

Embodiment 3

[0313] Embodiment 3: In this embodiment, a wide-spectrum polarized Mo / Si multilayer film is designed, and the specific optical path and film structure are shown in Figure 10(a) and Figure 10(b) respectively. combine figure 1 Further explain the implementation steps of the combination of high-dimensional multi-objective genetic algorithm and direction selection high-dimensional multi-objective genetic algorithm for the design of wide-spectrum polarization Mo / Si multilayer film, as follows:

[0314] Step I: Broad-spectrum polarized multilayer film system design based on high-dimensional multi-objective genetic algorithm

[0315] (1.1) Input the initial parameter values ​​of wide-spectrum polarization Mo / Si multilayer film design, including population size N, variation probability p m , crossover operator η c , mutation operator η p , the evolution algebra j, the optimally designed film layer number t, and the optimal search range for the geometric thickness of the film layer....

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Abstract

The invention discloses a high-dimensional multi-objective optimization design method for an optical thin film. The method comprises the steps that a high-dimensional multi-objective genetic algorithmis applied to solve non-dominated solutions of multiple performance objectives of the optical multilayer film, distribution of the non-dominated solutions and the relation between the performance objectives are analyzed, meanwhile, the non-dominated solutions are optimized, and therefore the optimized evolution direction is determined; and a direction selection high-dimensional multi-objective genetic algorithm is applied to carry out local fine search on the determined optimal evolution direction to obtain an optimal film system design of the high-dimensional multi-objective optimization design. The design method provided by the invention is helpful for obtaining a comprehensive film system design and reducing the preparation risk of a complex multilayer film under certain process conditions, and has wide applicability and relatively high practical application value.

Description

technical field [0001] The invention relates to a design method of an optical multilayer film, in particular to a high-dimensional multi-objective optimization design method of an optical film. Background technique [0002] In the field of optical thin film research, in order to meet the performance requirements of optical systems for high reflectivity, broadband reflectivity or narrowband transmittance, many optical components must be coated with multilayer films composed of two or more materials alternately. Especially for extreme ultraviolet (EUV) and soft X-ray bands, almost all materials are opaque and have a refractive index very close to 1, so EUV and soft X-ray optical systems must use reflective optical systems composed of multilayer film elements. [0003] In recent years, with the development of thin-film optical technology, multi-layer optical components have been widely and importantly applied in the fields of astronomy, spectroscopy and semiconductor technology...

Claims

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Application Information

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IPC IPC(8): G06F30/27G06F111/06G06F119/20G06N3/00G06N3/12
CPCG06N3/006G06N3/126G06F30/27G06F2111/06G06F2119/20
Inventor 匡尚奇林景全宋晓伟
Owner 长春国科精密光学技术有限公司
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