Unlock instant, AI-driven research and patent intelligence for your innovation.

A substrate processing device for semiconductor refrigeration sheet production

A technology for processing devices and refrigeration chips, which is applied in the direction of manufacturing tools, grinding drive devices, metal processing equipment, etc., can solve the problems of poor practicability, difficulty in parallelism, and low efficiency, so as to reduce difficulty, improve processing efficiency, and enhance The effect of practicality

Active Publication Date: 2022-02-01
江西北冰洋实业有限公司
View PDF6 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0002] As we all know, ceramic chips are an important part of semiconductor refrigeration chips. When processing ceramic chips, it is necessary to polish the ceramic chips to improve the quality of semiconductor cooling chips. The substrate processing device for semiconductor cooling chips is a kind of During the production and processing of refrigerating sheets, the device used to polish ceramic sheets has been widely used in the field of semiconductor refrigerating sheet production; the existing substrate processing device for refrigerating sheet production includes a workbench and a grinding mechanism , the bottom of the workbench is provided with four sets of legs, and the grinding mechanism is installed on the top of the workbench; when the existing substrate processing device for semiconductor refrigeration chip production is used, the staff starts the grinding mechanism on the top of the workbench, and then the staff will The surface to be polished of the ceramic chip is polished close to the grinding mechanism, and then the other side of the ceramic chip can be polished; in the use of the existing substrate processing device for the production of semiconductor refrigeration chips, it is found that grinding the ceramic chip face by face is more efficient. At the same time, due to human factors, it is difficult to make the two polished surfaces of the ceramic tile have a high parallelism, resulting in poor practicability

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • A substrate processing device for semiconductor refrigeration sheet production
  • A substrate processing device for semiconductor refrigeration sheet production
  • A substrate processing device for semiconductor refrigeration sheet production

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0017] The specific implementation manners of the present invention will be further described in detail below in conjunction with the accompanying drawings and embodiments. The following examples are used to illustrate the present invention, but are not intended to limit the scope of the present invention.

[0018] Such as Figure 1 to Figure 4As shown, a substrate processing device for the production of semiconductor refrigeration chips of the present invention includes a workbench 1 and a grinding mechanism. The bottom end of the workbench 1 is provided with four sets of legs 2; Two sets of adjusting plates 5, two sets of extruding plates 6, two sets of cylinder assemblies 7, two sets of support plates 8, two sets of limit shafts 9, two sets of stop rings 10, lifting handles 11 and fixing plates 12, and fixing frame 3 The lower left area is connected to the top left side of the workbench 1, the top of the fixed plate 12 is connected to the bottom of the upper right area of ...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The present invention relates to the technical field of semiconductor refrigerated sheet processing attachments, in particular to a substrate processing device for the production of semiconductor refrigerated sheets, which can simultaneously polish both sides of the ceramic sheet, thus improving the processing efficiency of the ceramic sheet and reducing the The two grinding surfaces of the tiles have a relatively high degree of parallelism; including the workbench and the grinding mechanism, four sets of legs are set at the bottom of the workbench; it also includes a fixed frame, a support plate, two sets of adjustment plates, and two sets of extruding plates. Pressure plate, two sets of cylinder assemblies, two sets of support plates, two sets of limit shafts, two sets of retaining rings, lifting handle and fixed plate, the lower left area of ​​the fixed frame is connected with the top left side of the workbench, and the top of the fixed plate Connected with the bottom of the upper right area of ​​the fixed frame, the grinding mechanism is provided with two groups of motor components, and the output ends of the two groups of motor components are equipped with grinding wheels, and the two groups of motor components are installed on the upper left area of ​​the fixed frame and the fixed plate respectively. At the left end, a card slot is arranged on the top of the support plate.

Description

technical field [0001] The invention relates to the technical field of auxiliary devices for processing semiconductor refrigerating chips, in particular to a substrate processing device for producing semiconductor refrigerating chips. Background technique [0002] As we all know, ceramic chips are an important part of semiconductor refrigeration chips. When processing ceramic chips, it is necessary to polish the ceramic chips to improve the quality of semiconductor cooling chips. The substrate processing device for semiconductor cooling chips is a kind of During the production and processing of refrigerating sheets, the device used to polish ceramic sheets has been widely used in the field of semiconductor refrigerating sheet production; the existing substrate processing device for refrigerating sheet production includes a workbench and a grinding mechanism , the bottom of the workbench is provided with four sets of legs, and the grinding mechanism is installed on the top of...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Patents(China)
IPC IPC(8): B24B7/17B24B7/22B24B27/00B24B41/06B24B47/00B24B47/12B24B47/22
CPCB24B7/17B24B7/222B24B27/0076B24B41/06B24B47/22B24B47/00B24B47/12
Inventor 陈文斌
Owner 江西北冰洋实业有限公司