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Optical waveguide preparation method and optical waveguide

A technology of optical waveguide and photoresist, which is applied in the direction of light guide, optics, optical components, etc., can solve the problems that gratings affect the appearance and use effect, and achieve the effect of improving appearance, use effect and high reliability

Inactive Publication Date: 2020-11-24
GOERTEK INC
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Problems solved by technology

[0003] The main purpose of the present invention is to propose an optical waveguide preparation method and the optical waveguide, aiming at improving the problem that the grating formed by the existing optical waveguide preparation method easily affects the appearance and the use effect

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  • Optical waveguide preparation method and optical waveguide

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Embodiment Construction

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention with reference to the accompanying drawings in the embodiments of the present invention. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of them. Based on the embodiments of the present invention, all other embodiments obtained by persons of ordinary skill in the art without creative efforts fall within the protection scope of the present invention.

[0032] It should be noted that if there are directional indications (such as up, down, left, right, front, back...) in the embodiment of the present invention, the directional indications are only used to explain how to move in a certain posture (as shown in the accompanying drawings). If the specific posture changes, the directional indication will also change accordingly.

[0033] In addition, if there are descriptions involving "first", "second" an...

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Abstract

The invention discloses an optical waveguide preparation method and an optical waveguide. The optical waveguide preparation method comprises the steps of providing a substrate, forming a to-be-etchedsubstrate on the substrate, and enabling the to-be-etched substrate to be an inorganic material; coating a photoresist on one side of the substrate to be etched; carrying out nanoimprint lithography on the photoresist to form a nanoimprint lithography mask; and etching the nanoimprint mask and the to-be-etched substrate by adopting dry etching so as to remove the nanoimprint mask, and forming a target grating on the to-be-etched substrate. According to the invention, the inorganic material is used as the substrate to be etched, the target grating is formed on the substrate to be etched by adopting dry etching, and the formed target grating is the inorganic material, so that the target grating has higher reliability, the problem of yellowing is not easy to occur, and the improvement of theaesthetic property and the use effect of the optical waveguide is facilitated.

Description

technical field [0001] The invention relates to the field of augmented reality, in particular to an optical waveguide preparation method and the optical waveguide. Background technique [0002] The existing AR (Augmented Reality, Augmented Reality) optical waveguide preparation method mainly forms a grating pattern on a photoresist by means of nanoimprinting. The main component of the grating obtained directly by nanoimprinting is photoresist, which is generally a high molecular polymer, which is not resistant to high temperature and high humidity, and will turn yellow after a long time, affecting the appearance and use effect. Contents of the invention [0003] The main purpose of the present invention is to provide an optical waveguide preparation method and the optical waveguide, aiming to improve the problem that the grating formed by the existing optical waveguide preparation method easily affects the appearance and the use effect. [0004] In order to achieve the ab...

Claims

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Application Information

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IPC IPC(8): G02B6/124G02B6/136
CPCG02B6/124G02B6/136
Inventor 杜凯凯赵东峰李琨臧法珩赵恩程鑫杨镇源
Owner GOERTEK INC
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