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High-voltage electrostatic protection structure

A technology for protecting structures and high-voltage static electricity, which is applied to circuits, electrical components, and electric solid devices, etc., can solve problems such as large latch-up risks, and achieve the effect of improving antistatic ability

Pending Publication Date: 2020-12-01
SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The maintenance voltage Vh of the traditional SCR structure generally does not exceed 10V after the Snap-back occurs, and there is a greater risk of latch-up in the application of the high-voltage port

Method used

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Embodiment Construction

[0037] The high-voltage electrostatic protection structure described in the present invention, such as image 3 As shown, a high-voltage SCR structure is formed, with a high-voltage N-well (HVNW) and a high-voltage P-well (HVPW) on a P-type substrate. The two are separated by a certain distance by the substrate, whose sides are not in contact with each other.

[0038] The high-voltage P well includes a P+ doped region (the first heavily doped region) and an N+ doped region (the second heavily doped region), and a field oxygen is separated between the P+ doped region and the N+ doped region, Wherein the N+ doped region is close to the central region of the SCR structure; the high-voltage N well includes an N+ doped region (the fourth heavily doped region) and a P+ doped region (the third heavily doped region), between the two A section of field oxygen is also spaced between them, wherein the P+ doped region is close to the central region of the SCR structure.

[0039] The sur...

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PUM

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Abstract

The invention discloses a high-voltage electrostatic protection structure, which is based on SCR, and is provided with a first high-voltage trap and a second high-voltage trap in a substrate, whereina first heavily doped region and a second heavily doped region are arranged in the first high-voltage trap, a third heavily doped region and a fourth heavily doped region are arranged in the second high-voltage trap, a fifth heavily doped region and a sixth heavily doped region are arranged on the surface layer of the substrate between the first high-voltage trap and the second high-voltage trap,the fifth heavily doped region is close to the first high-voltage trap, the sixth heavily doped region is close to the second high-voltage trap, the fifth heavily doped region stretches across the first high-voltage trap and the substrate, and the sixth heavily doped region stretches across the second high-voltage trap and the substrate. According to the invention, the shapes, the numbers and thediffusion radiuses of the fifth heavily doped region and the sixth heavily doped region are adjustable, so that the current distribution of the parasitic SCR structure can be flexibly controlled, thepurpose of adjusting the Snap-back sustaining voltage by adjusting the proportion of a current outflow path is achieved, and the antistatic capability of the device is improved.

Description

technical field [0001] The invention relates to the field of design and manufacture of semiconductor devices, in particular to a high-voltage electrostatic protection structure. Background technique [0002] Static electricity is an objective natural phenomenon, which can be produced in many ways, such as contact, friction, induction between electrical appliances, etc. Static electricity is characterized by long-term accumulation, high voltage, low power, small current and short action time. Static electricity causes serious harm in many fields. Friction electrification and human body static electricity are two major hazards in the electronics industry, which often cause unstable operation or even damage of electronic and electrical products. [0003] As the feature size of the semiconductor integrated circuit manufacturing process becomes smaller and smaller, the size of the chip unit is also smaller and smaller, and the antistatic ability of the chip becomes more and mor...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L27/02
CPCH01L27/0262H01L27/0296
Inventor 苏庆
Owner SHANGHAI HUAHONG GRACE SEMICON MFG CORP
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