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Display substrate and manufacturing method thereof, display panel, display device

A technology for display substrates and substrate substrates, which is used in instruments, semiconductor devices, electrical components, etc., can solve the problem of uneven unevenness on the surface of the flattening layer, and achieve the effects of optimizing flatness, ensuring uniformity, and improving luminous quality.

Active Publication Date: 2022-05-24
HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD +1
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the embodiment of the present application is to provide a display substrate and its preparation method, a display panel, and a display device, so as to solve the technical problem of the uneven surface of the planarization layer formed in the prior art

Method used

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  • Display substrate and manufacturing method thereof, display panel, display device
  • Display substrate and manufacturing method thereof, display panel, display device
  • Display substrate and manufacturing method thereof, display panel, display device

Examples

Experimental program
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Embodiment 1

[0052] Reference attached figure 1 -Attached Figure 7 , Embodiment 1 of the present invention proposes a preparation method of a display substrate, the preparation method comprising:

[0053] S1: forming a patterned film layer 2 on the base substrate 1, the first surface of the patterned film layer 2 having a pit portion 21 and a non-pit portion 22;

[0054] Specifically, refer to the appendix figure 1 , the material of the base substrate 1 is not specifically limited here, for example: it can be glass; the patterned film layer 2 can be any film layer on the base substrate 1, it can be a film layer, or it can be a plurality of film layers , for example: the patterned film layer 2 may include a plurality of film layers forming thin film transistors; the surface of the patterned film layer 2 is uneven, for example, the position of the thin film transistor will be slightly higher than other positions, so that the patterned film layer 2 formed is relatively The first surface o...

Embodiment 2

[0089] Reference attached Image 6 and attached Figure 7 , the second embodiment of the present invention provides a display substrate, the display substrate includes: a base substrate 1 and a patterned film layer 2 disposed on the base substrate 1, the first surface of the patterned film layer 2 is It has a pit part 21 and a non-pit part 22;

[0090] a planarization layer 3, the planarization layer 3 is disposed on the first surface of the patterned film layer 2;

[0091] The lyophilicity of the recessed portion 21 is higher than that of the non-recessed portion 22 , and the first surface is the surface of the patterned film layer 2 away from the base substrate 1 .

[0092] Specifically, the material of the base substrate 1 is not specifically limited here, for example: it can be glass; the patterned film layer 2 can be any film layer on the base substrate 1, it can be one film layer, or it can be a plurality of film layers. Membrane layer; the first surface of the patter...

Embodiment 3

[0103] The third embodiment of the present invention provides a display panel, the display panel includes: the above-mentioned display substrate.

[0104] Specifically, the display panel may be a liquid crystal display panel, or may also be an organic electroluminescence display substrate, which is not specifically limited here.

[0105] According to the above list, an embodiment of the present invention provides a display panel, including the above-mentioned display substrate, and the above-mentioned display substrate utilizes lyophilic and lyophobic properties, and considers the shrinkage ratio of the planarization layer 3 of the film layers with different thicknesses, The optimization of the flatness of the flattening layer 3 is realized, so that when other film layers are formed on the flattening layer 3, the uniformity of the other film layers is ensured, so that the light emitted from the display panel is uniform.

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Abstract

The present application provides a display substrate and a preparation method thereof, a display panel, and a display device, which relate to the field of display technology. Wherein, the display substrate and the preparation method thereof include forming a patterned film layer on the base substrate, the first surface of the patterned film layer has pits and non- pits; on the first surface of the patterned film layer A planarization layer is formed on the surface; wherein, the lyophilicity of the pit part is higher than that of the non-crater part, and the first surface is the part of the patterned film layer away from the base substrate surface. The technical solution of the present application can solve the technical problem of uneven surface of the planarization layer formed in the prior art.

Description

technical field [0001] The present application relates to the field of display technology, and in particular, to a display substrate and a method for manufacturing the same, a display panel, and a display device. Background technique [0002] At present, with the rapid development of science and technology, various display devices are gradually developed, such as: Liquid Crystal Display (LCD), Organic Light-Emitting Diode Display (OLED) . [0003] Whether it is an LCD display device or an OLED display device, a flat layer is often formed during the manufacturing process. If the flatness of the flat layer is insufficient, unevenness is likely to occur in the pixels, thereby seriously affecting the performance of the display device. [0004] Taking an OLED display device as an example, since the surface formed on the base substrate is uneven (for example, the position of the thin film transistor may be slightly higher than other positions), when a flat layer is formed on the ...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): H01L27/32G02F1/1333
CPCG02F1/1333H10K59/1201H10K59/122H10K59/124H10K71/00
Inventor 任文明朱飞飞贾文斌
Owner HEFEI XINSHENG OPTOELECTRONICS TECH CO LTD