A Metal-Organic Decomposition Growth Method of Metastable Phase Rare Earth Nickel Oxide Thin Films

A metal-organic decomposition and oxide thin film technology, applied in chemical instruments and methods, single crystal growth, single crystal growth, etc., can solve the problem of relying on vacuum process, difficult to achieve large thickness and high uniform deposition growth, difficult to achieve large area deposition, etc. problems, to achieve the effect of large deposition thickness

Active Publication Date: 2021-12-03
UNIV OF SCI & TECH BEIJING
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

1) Thin films such as samarium-nickel-oxygen and neodymium-nickel-oxygen are deposited on substrates with similar crystal structure and lattice parameters by pulsed laser deposition or metal-organic vapor deposition to make them non-uniform on the lattice template of the substrate Nucleation, thus forming a metastable phase film [APL Mater.2014, 2, 116110]; this type of method relies on the vacuum preparation process, and its technology is relatively complicated and difficult to achieve large-area deposition
2) Use magnetron sputtering and other methods to grow precursors of rare earth, nickel and other elements on silicon substrates, and then trigger the precursors to form rare earth nickel-based oxide metastable phase twisted perovskite through solid-state reaction under high oxygen pressure Structure [Nat.Commun.,2013,4,2676]; this kind of method also relies on the vacuum process, the cost is high and the process is relatively complicated
3) Use the ethylene glycol methyl ether solution of rare earth nitrate and nickel acetate as the precursor, and apply it on lanthanum aluminate, strontium titanate, etc. that have similar crystal structure and lattice parameters to rare earth nickel-based oxides by means of chemical spin coating. On a single crystal substrate, through the solid-state reaction under high oxygen pressure, the heterogeneous nucleation template effect between the thin film substrates and the high oxygen pressure effect are combined to realize the precursor to the rare earth nickel oxide phase with a metastable phase structure. Transformation [Matter, 2020, 2, 1; Mater. Horiz., 2019, 6, 788]; it is difficult to precisely control the viscosity and other characteristics of the precursor by such methods, so it is difficult to achieve large-thickness and high-uniform deposition growth of the material
[0003] In summary, there is still a lack of an effective non-vacuum, low-cost, large-thickness, and highly uniform growth method for metastable phase rare earth nickel-based oxide thin film materials in this field.

Method used

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  • A Metal-Organic Decomposition Growth Method of Metastable Phase Rare Earth Nickel Oxide Thin Films
  • A Metal-Organic Decomposition Growth Method of Metastable Phase Rare Earth Nickel Oxide Thin Films
  • A Metal-Organic Decomposition Growth Method of Metastable Phase Rare Earth Nickel Oxide Thin Films

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Embodiment 1

[0024] Embodiment 1: using isooctanoic acid, samarium acetate hydrate, nickel acetate hydrate, ammonia water, xylene, etc. as initial raw materials; a certain proportion of samarium acetate, isooctanoic acid, and ammonia water are mixed, fully reacted and dried under stirring, Obtain samarium isooctanoate; mix a certain proportion of nickel acetate, isooctanoic acid and ammonia water, react fully under stirring and dry to obtain nickel isooctanoate. Mix the prepared samarium isooctanoate and nickel isooctanoate at a molar ratio of 1:1, and dissolve them in xylene solution; use the ratio of samarium isooctanoate, nickel isooctanoate and xylene solvent to control the thickness and uniformity of the film. Further, 100 drops of the above solution were spin-coated on the lanthanum aluminate substrate and dried; then annealed at 600 degrees Celsius and 500 MPa oxygen for 48 hours to obtain a samarium-nickel-oxygen thin film material. In one optimized condition experiment, the solute...

Embodiment 2

[0025] Example 2: Prepare samarium isobutyrate and nickel isobutyrate in advance, mix them at a molar ratio of 1:1, and dissolve them in xylene solution, and control the concentration and viscosity of the prepared solution to an optimal range. The above solution was spin-coated on a lanthanum aluminate substrate and dried; then annealed at 1200 degrees Celsius and 900 MPa oxygen for 0.5 hours to obtain a samarium-nickel-oxygen thin film material. The prepared film has obvious metal-insulator phase transition characteristics near 120 degrees Celsius, and its insulator phase has typical negative temperature resistance coefficient thermistor electrical transport characteristics in a wide temperature range below the phase transition temperature. Compared with the case of using the same solvent and having the same concentration of nickel isooctanoate and samarium isooctanoate as the solute in Example 1, the viscosity of the precursor solution is lower, and the film obtained subseque...

Embodiment 3

[0026] Example 3: Prepare neodymium isooctanoate and nickel isooctanoate in advance, mix them at a molar ratio of 1:1, and dissolve them in xylene solution, and control the concentration and viscosity of the prepared solution to an optimal range. The above solution was spin-coated on a silicon substrate and dried; then annealed at 900 degrees Celsius and 0.2 MPa oxygen for 50 hours to obtain a neodymium-nickel-oxygen thin film material. The prepared film has obvious metal-insulator phase transition characteristics around 120 Kelvin, such as figure 2 Shown; In a wide temperature range below the phase transition temperature, its insulator phase has typical electrical transport characteristics of a negative temperature coefficient thermistor.

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Abstract

A metal-organic decomposition growth method for a metastable phase rare earth nickel oxide thin film. It is characterized in that organic acid salts such as rare earth hydroxy acids and nickel hydroxy acids are dissolved in a single benzene ring aromatic organic solvent as a precursor, spin-coated on the substrate and annealed under high oxygen pressure to achieve a metastable phase Non-vacuum growth of metastable rare-earth nickel-based oxide thin-film materials with structure and apparent metal-insulator phase transition properties. The viscosity of the precursor can be adjusted through the number of carbon atoms of the carbon branched functional group of the precursor, the spatial configuration, the ratio of the solute to the solvent, etc., so as to control the growth characteristics such as the deposition thickness and growth uniformity of the film. The method is easy to operate and low in cost, and can realize the large-size, large-thickness, and high-uniformity growth of metastable-phase rare-earth nickel-based oxide film materials with different rare-earth elements. The prepared film has multiple electronic phase transition characteristics, and can be applied to thermistors, fuel cell proton conductors, biomass detection, ocean weak electric field detection, strong correlation logic electronic devices, and the like.

Description

technical field [0001] The invention belongs to the field of electronic materials, and in particular relates to a technical method for growing a rare earth nickel oxide film material with a thermodynamic metastable phase twisted perovskite structure by a metal organic decomposition method. The method can greatly improve the deposition uniformity and deposition thickness of the metastable phase thin film, has simple and low cost of operation, and does not need a vacuum process. The prepared film has the characteristics of metal-insulator phase transition under temperature triggering, and can be applied to sudden change thermistors, negative temperature coefficient thermistors, laser weapon protection, strongly correlated logic devices, atmosphere sensors, thermochromic windows, etc. Background technique [0002] Metastable phase rare earth nickel oxide is a kind of metastable phase metal insulator electronic phase change material with twisted perovskite structure, and its che...

Claims

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Application Information

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Patent Type & Authority Patents(China)
IPC IPC(8): C30B29/22C30B29/64C30B1/02C30B1/12
CPCC30B1/02C30B1/12C30B29/22C30B29/64
Inventor 陈吉堃李海岩张秀兰
Owner UNIV OF SCI & TECH BEIJING
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