Supercharge Your Innovation With Domain-Expert AI Agents!

Layout DRC violation comparison and positioning method

A positioning method and illegal technology, applied in CAD circuit design, instruments, electrical and digital data processing, etc., can solve the problem of lack of comparison of different types of graphics coordinates, and achieve the goal of shortening project cycle, improving efficiency and accuracy, and reducing research and development costs. Effect

Pending Publication Date: 2021-04-20
SHANGHAI HUALI MICROELECTRONICS CORP
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] In view of the shortcomings of the prior art described above, the purpose of the present invention is to provide a method for comparing and locating layout DRC violations, which is used to solve the problem of lack of coordination between different types of graphic coordinates in the rules for comparing data coordinates in the prior art. Compare to meet the needs of DRC development

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Layout DRC violation comparison and positioning method
  • Layout DRC violation comparison and positioning method
  • Layout DRC violation comparison and positioning method

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0031] Embodiments of the present invention are described below through specific examples, and those skilled in the art can easily understand other advantages and effects of the present invention from the content disclosed in this specification. The present invention can also be implemented or applied through other different specific implementation modes, and various modifications or changes can be made to the details in this specification based on different viewpoints and applications without departing from the spirit of the present invention.

[0032] see Figure 1 to Figure 11 . It should be noted that the diagrams provided in this embodiment are only schematically illustrating the basic idea of ​​the present invention, and only the components related to the present invention are shown in the diagrams rather than the number and shape of components in actual implementation. and size drawing, the type, quantity and proportion of each component can be changed arbitrarily duri...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a layout DRC violation comparison and positioning method. The method comprises the following steps: generating an original-version violation coordinate file containing original-version violation coordinates and a new-version violation coordinate file containing new-version violation coordinates; judging whether the violation types are consistent or not; if theviolation types are consistent and are all polygons, respectively converting the original-version violation coordinate file and the new-version violation coordinate file into an original version layout file and a new version layout file, carrying out comparison, and highlighting and positioning different polygons after comparison; if the violation coordinate types are consistent and are edges, highlighting and positioning different edges after comparison; and if the types of the violation coordinates are inconsistent, converting the violation coordinates into consistent types. According to the layout DRC violation comparison and positioning method, layout violation comparison and positioning can be efficiently achieved, the defects that when the number of violations is too large, time and labor are consumed in manual comparison, and mistakes are prone to occurring are overcome, and therefore the DRC development efficiency and accuracy are improved, the project period is shortened, and the research and development cost is reduced.

Description

technical field [0001] The invention relates to the field of semiconductor technology, in particular to a method for comparing and locating layout DRC violations. Background technique [0002] Layout design rules are the key factors to ensure successful circuit design, smooth mass production of products and guaranteed chip yield. As process nodes shrink and layout design rules become more and more complex, the accuracy of design rule checking (DRC) is particularly important. During the DRC development process, in order to ensure the accuracy of the new version of DRC, a typical method is to evaluate the same layout with the original DRC, and compare the number and location of layout violations checked by the two versions of DRC. When there are too many violations, the manual comparison method is time-consuming, laborious and error-prone, and cannot guarantee the efficiency and accuracy of DRC development. [0003] The coordinate data comparison method of the DRC file discl...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): G06F30/31G06F40/169
Inventor 薛芳琦杨婷张倩倩
Owner SHANGHAI HUALI MICROELECTRONICS CORP
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More