Wafer electroplating device and electroplating method
An electroplating device and wafer technology, applied in the direction of electrodes, circuits, electrolysis process, etc., can solve problems such as uneven thickness of electroplating layer, and achieve the effect of reducing the difficulty of grinding
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[0025]Next, the technical solutions in the embodiments of the present invention will be apparent from the embodiment of the present invention, and it is clearly described, and it is understood that the described embodiments are merely embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, those of ordinary skill in the art will belong to the scope of the present invention without all other embodiments obtained without creative labor.
[0026]The plating device of conventional wafer 100 is first described before describing the embodiments of the present invention.
[0027]Seefigure 1 The electroplating device of the conventional wafer 100 includes a plating tank 30, an electroplated anode 40, and a power source 120, and an electroplating groove 30 is provided with a plating solution 70, and a seed layer 20 is provided, and the electroplated anode 40 includes a towant of seed layer 20. The first surface 401, the seed layer 20 inc...
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