MEMS probe structure for chip testing in ultra-high temperature working environment

A working environment and chip testing technology, applied in the field of MEMS probe structure, can solve problems such as inability to complete bare core test work, inability to complete bare core test work, plastic deformation of probes, etc.

Active Publication Date: 2021-05-28
MAXONE SEMICON CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0006] This kind of probe card with guide plate combination structure can realize the bare core test work under most working conditions, however, there are still some bare core test tasks that cannot be completed for the following reasons: In order to make the test real and effective, we need to ensure that the bare core The test environment is consistent with the working environment of the chip. Different chips have different working temperatures. Some chips work in a high temperature environment of about 100 degrees Celsius, while some chips work in an ultra-high temperature environment of 200 degrees Celsius.
For those chips that work in an ultra-high temperature environment, we also need to complete the test in the same temperature environment. Due to the limitation of the probe material, the probe will lose its elasticity in such an ultra-high temperature environment. If you insist on using structures such as intermediate guides or If the method is used to bend the probe, it will cause the probe to be plastically deformed and unable to rebound, not only cannot complete the test work of the bare core, but also will damage the probe card in severe cases
[0007] It can be seen that referring to the solution provided by the invention patent "Probe Device for Vertical Probe Card", although it can be applied to the testing work of most bare cores, it still cannot ensure large size or Effective contact between die and probe during multi-test point chip testing

Method used

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  • MEMS probe structure for chip testing in ultra-high temperature working environment
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  • MEMS probe structure for chip testing in ultra-high temperature working environment

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specific Embodiment approach 1

[0092] The following is a specific implementation of the MEMS probe structure of the present invention for chip testing in an ultra-high temperature working environment.

[0093] The structure of the MEMS probe for chip testing under the ultra-high temperature working environment under the present embodiment, the structural diagram is as follows figure 1 As shown, the MEMS probe structure is provided with a PCB board 3, an adapter plate 2 and a composite probe head structure 1 in sequence from top to bottom, and the composite probe head structure 1 includes an upper guide plate 1-1 and a middle guide plate 1-2 And the lower guide plate 1-3, the probe 1-4 starts from the adapter plate 2, passes through the upper guide plate 1-1 and the middle guide plate 1-2, and protrudes from the lower guide plate 1-3; wherein, the upper guide plate 1-1 , the middle guide plate 1-2 and the lower guide plate 1-3 are made of insulating materials, and the probes 1-4 are made of metal conductive ...

specific Embodiment approach 2

[0099] The following is a specific implementation of the MEMS probe structure of the present invention for chip testing in an ultra-high temperature working environment.

[0100] The MEMS probe structure for chip testing under the ultra-high temperature working environment under this embodiment, on the basis of the specific embodiment 1, further defines that the middle probe 1-4-2 is composed of at least one of antimony, bismuth or gallium Made of metal alloy materials. Since antimony, bismuth, and gallium are substances that expand with cold and shrink with heat, they are often used to make alloys to reduce the influence of temperature on precision instruments. Therefore, using them to make the middle probe 1-4-2 can not only meet the conductivity, but also can Realize thermal shrinkage and cold expansion characteristics.

[0101] In addition, the nickel sulfide used to make the tempered glass self-explode is also a substance that expands with cold and shrinks with heat, and...

specific Embodiment approach 3

[0103] The following is a specific implementation of the chip testing method in the wide temperature range working environment of the present invention.

[0104] The chip testing method under the wide temperature range working environment under this embodiment is implemented on the MEMS probe structure facing the chip testing under the ultra-high temperature working environment described in the specific embodiment 1 or the specific embodiment 2. The wide temperature range working environment The chip testing method includes the chip testing method under the normal temperature working environment and the chip testing method under the ultra high temperature working environment, wherein, the chip testing method flow chart under the normal temperature working environment is as follows figure 2 As shown, the flow chart of the chip testing method under the ultra-high temperature working environment is as follows image 3 shown;

[0105] The normal temperature working environment r...

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Abstract

The invention discloses an MEMS probe structure for chip testing in an ultrahigh-temperature working environment, and belongs to the technical field of precision testing and metering, micro electro mechanical systems, IC chip testing and probe cards. The structure is sequentially provided with a PCB, an adapter plate and a composite probe head structure from top to bottom, the composite probe head structure comprises an upper guide plate, a middle guide plate and a lower guide plate, and a probe penetrates through the upper guide plate and the middle guide plate and then extends out of the lower guide plate; the probe comprises an upper probe mounted on the upper guide plate, a middle probe penetrating through the middle guide plate and a lower probe mounted on the lower guide plate; the upper probe and the lower probe have thermal expansion and cold contraction characteristics; and the middle probe has the characteristics of thermal shrinkage and cold expansion. As a key technology in the MEMS probe structure and the testing method for chip testing in the ultra-high-temperature working environment, the MEMS probe structure can ensure effective contact between a bare chip and a probe in the ultra-high-temperature working environment in the large-size or multi-testing-point chip testing process, and then facilitates testing of the chip.

Description

technical field [0001] The invention relates to a MEMS probe structure for chip testing in an ultra-high temperature working environment, belonging to the technical fields of precision testing and measurement, micro-electromechanical systems, IC chip testing and probe cards. Background technique [0002] A probe card is a device used to test bare die. The performance of the chip is tested by touching the probe to the pad or contact of the bare core to form an electrical connection, and by writing a test program to the chip. [0003] A key technology to realize the test is that the probes must all touch the pads or contacts of the bare core, which puts forward very high requirements on whether the ends of all probes are on the same plane. In this application, the degree to which the probe ends are in the same plane is defined as probe flatness. For a probe card with a small size and a small number of probes, it is easier to control the flatness of the probes, but for a prob...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01R31/28G01R1/073
CPCG01R31/2801G01R1/07328
Inventor 于海超
Owner MAXONE SEMICON CO LTD
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