Highly deformable and thermally treatable continuous coils and method of producing the same
A coil, line speed technology, used in coil manufacturing, thin material processing, transformer/inductor components, etc., can solve problems such as damage to the pretreatment layer
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[0054] The methods of making anodized continuous webs described herein include various process parameters that must be adjusted to provide the desired thin anodized film layer. In some respects, for example, when the system described herein is placed in a continuous coil processing line, the various process parameters that must be adjusted to provide the desired thin anodized film layers depend on the continuous coil The line speed of the material processing line. For example, changes in applied power may affect the properties of thin anodized film layers, including dielectric breakdown, thickness, and uniformity (eg, higher line speeds may require higher power applications). In other examples, line speed may affect the thickness, uniformity and defect occurrence of thin anodized film layers. Therefore, producing a thin anodic oxide layer with certain properties may require extensive selection of process parameters to obtain the desired thin anodic oxide layer.
[0055] The ...
Embodiment 1
[0089] Example 1: Adhesion Durability Test
[0090] Anodized continuous webs were prepared for bond durability testing according to the methods described herein, including optional artificial aging, etching, electrolytic cleaning, and anodizing. In some instances where etching was performed without artificial aging, the samples were artificially aged after anodization. Processing parameters are outlined in Table 1 below:
[0091] Table 1
[0092]
[0093]
[0094] As shown in Table 1, samples TAF-A, TAF-B, TAF-C, TAF-D, TAF-E, and TAF-F were subjected to an optional artificial aging step to achieve a T6 state prior to the etching step. Samples TAF-G, TAF-H and TAF-1 were provided in F temper and artificially aged to T6 temper before bonding. All samples were etched in 0.1M phosphoric acid. Etching temperatures are shown in Table 1 above. After the etching step, all samples were subjected to the electrolytic cleaning step described above for 10 seconds at various vol...
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