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5results about How to "Reduce defect level" patented technology

Negative electrode material and preparation method thereof, negative electrode plate and battery

The invention relates to a negative electrode material and a preparation method thereof, a negative electrode plate and a battery, the negative electrode material comprises an active substance and a carbon material located on at least part of the surface of the active substance, and the active substance comprises silicon particles and graphite; in a Raman surface scanning spectrogram of the negative electrode material, the characteristic peak intensity of silicon particles in the negative electrode material in a range of 500 cm <-1 > to 520 cm <-1 > is I1, the characteristic peak intensity of silicon particles in the negative electrode material in a range of 1345 cm <-1 > to 1355 cm <-1 > is I2, and the characteristic peak intensity of silicon particles in the negative electrode material in a range of 1570 cm <-1 > to 1610 cm <-1 > is I3; the characteristic peak intensity of graphite in the negative electrode material in the range of 1345 cm <-1 > to 1355 cm <-1 > is I2 ', the characteristic peak intensity of graphite in the range of 1570 cm <-1 > to 1610 cm <-1 > is I3', and in the negative electrode material, # imgabs0 # 0.01 < = K < = 10. The negative electrode material provided by the invention has relatively high specific capacity and good electrolyte infiltration performance, and the prepared negative electrode plate has relatively low resistivity.
Owner:BTR NEW MATERIAL GRP CO LTD +1

A laser powder bed additive manufacturing method and equipment

PendingCN122077030AReduce defect levelImprove laser scanning printing efficiency
This invention discloses a laser powder bed additive manufacturing method and equipment. The laser powder bed additive manufacturing method includes: laying powder material on a substrate in a forming chamber; purging the forming chamber; scanning and printing on the powder material according to a preset laser scanning path, melting the powder material along the preset laser scanning path; wherein the preset laser scanning path includes moving in a first direction while oscillating in a second direction, the first direction intersecting the second direction; after printing, annealing and cutting the molten powder material to obtain a part. This invention can effectively change the internal flow state of the molten pool, reduce the formation of internal defects in the part, and improve the efficiency of laser scanning printing.
Owner:SHANGHAI AIRCRAFT MFG

Control method for solving camber in rough rolling process of hot rolling process

The invention discloses a control method for solving camber in the rough rolling process of a hot rolling procedure, which belongs to the technical field of hot continuous rolling and comprises the following steps of: controlling the centering deviation of a rough rolling inlet side guide plate and a rough rolling outlet side guide plate within a threshold range; a short stroke function is added to a rough rolling inlet side guide plate; when the camber direction is the operation side, the stroke of the HWC cylinder on the transmission side is increased, so that the center line of the vertical roll deviates to the transmission side; when the camber direction is the transmission side, the stroke of the HWC cylinder on the operation side is increased, so that the center line of the vertical roll deviates to the operation side; when the camber direction is the operation side, a lining plate is additionally arranged at the transmission side outlet position or the operation side inlet position of a rough rolling upper roller; and when the camber direction is the transmission side, a lining plate is additionally arranged at the transmission side inlet position or the operation side outlet position of the rough rolling upper roller. According to the method, the camber defect can be effectively treated and corrected.
Owner:TIANTIE HOT ROLLED PLATE CO LTD

Preparation method and application of nano zinc sulfide with adjustable crystal structure

The invention provides a preparation method and application of nano zinc sulfide with adjustable crystal structure, belonging to the technical field of nano zinc sulfide materials. The invention relates to a method for controlling the defect structure of zinc sulfide by utilizing the substituent structure of a mercapto surfactant. The increase in the number of carbon atoms of the mercapto surfactant and the presence of a branched chain can significantly reduce the particle size and defect degree of zinc sulfide. The increase in the coordination ability of the mercapto surfactant can reduce the defect degree and the particle size. The non-polar substituent group is too short, the particle size of zinc sulfide is mainly large particles with uneven distribution, and the material has a large number of surface defects and dislocation structures. The method can be applied to improving the electrochemical properties such as the first cycle coulomb efficiency of negative electrode materials of ion batteries, can increase the material conductivity and the ion transmission path in the material body, improve the electrochemical reaction kinetics and reversibility of zinc sulfide, and improve the material capacity and rate performance.
Owner:湖南工商大学

A synergistic silica sol high-efficiency polishing liquid for silicon wafers and a preparation method thereof

This invention relates to a high-efficiency polishing slurry for silicon wafers using a synergistic silica sol, which is mainly composed of the following raw materials in the indicated weight ratios: 10-30 parts silica abrasive; 0.001-0.5 parts nitrogen-containing functional group promoter; 0.01-1 part surfactant; 0.1-5 parts acid-base adjuster; and 30-90 parts water. This polishing slurry, through the synergistic effect of the compound design of amino silica sol raw materials and the interfacial reaction regulation mechanism of the nitrogen-containing functional group promoter, effectively improves the material removal rate, significantly improves polishing uniformity, inhibits local over-corrosion and particle agglomeration, reduces surface roughness, and simultaneously reduces particle residue and metal ion contamination. It achieves a synergistic balance between high efficiency and low damage, meeting the performance requirements of polishing slurries for precision machining of high-end single-crystal silicon wafers.
Owner:ZHENGZHOU RES INST FOR ABRASIVES & GRINDING CO LTD