38results about How to "Enhanced nucleation" patented technology

An optical semiconductor device with a multiple quantum well structure, in which well layers and barrier layers comprising various types of semiconductor layers are alternately layered, in which device well layers (6a) of a first composition based on a nitride semiconductor material with a first electron energy and barrier layers (6b) of a second composition of a nitride semiconductor material with electron energy which is higher in comparison with the first electron energy are provided, followed, seen in the direction of growth, by a radiation-active quantum well layer (6c), for which the essentially non-radiating well layers (6a) and the barrier layers (6b) arranged in front form a superlattice.

Various processes and related systems are provided for making structures on substrate surfaces. Disclosed are methods of making a structure supported by a substrate by providing a substrate having a receiving surface and exposing at least a portion of the receiving surface to output from a remote plasma of an inert gas. The remote plasma has an energy low enough to substantially avoid etching or sputtering of the receiving surface but sufficient to generate a treated receiving surface. The treated surface is contacted with a deposition gas, thereby making the structure supported by the substrate.

A method of modifying a polymeric material whereby the polymeric material is modified to give a highly durable surface without decreasing its strength. Namely, a polymeric material is modified by the method comprising a combination of an impregnation step, an activation step, a step of grafting a monomer and a step of a treatment with a hydrophilic polymer. Thus, the hydrophilic nature, adhesiveness, and so forth of polymeric materials such as polyolefins can be improved without causing any decrease in the practical strength. The thus obtained polymeric materials are usable in articles with a need for high water absorptivity and high adhesiveness, for example, water-absorbing materials and water-retaining materials for medical, sanitary, cosmetic articles or supplies, agricultural materials, synthetic papers, filters and fiber products for clothes, for improving adhesiveness of composite materials and the like. Among all, these materials are particularly usable in dentition orthodontic appliances, writing implements and battery separators.

This invention relates to organometallic compounds represented by the formula (L1)xM(L2)y wherein M is a metal or metalloid, L1 and L2 are different and are each a hydrocarbon group or a heteroatom-containing group; x is a value of at least 1; y is a value of at least 1; x+y is equal to the oxidation state of M; and wherein (i) L1 has a steric bulk sufficiently large such that, due to steric hinderance, x cannot be a value equal to the oxidation state of M, (ii) L2 has a steric bulk sufficiently small such that, due to lack of steric hinderance, y can be a value equal to the oxidation state of M only in the event that x is not a value of at least 1, and (iii) L1 and L2 have a steric bulk sufficient to maintain a heteroleptic structure in which x+y is equal to the oxidation state of M; a process for producing the organometallic compounds, and a method for producing a film or coating from organometallic precursor compounds.

In certain embodiments, the invention relates to an electrochemical device having a liquid lubricant impregnated surface. At least a portion of the interior surface of the electrochemical device includes a portion that includes a plurality of solid features disposed therein. The plurality of solid features define a plurality of regions therebetween. A lubricant is disposed in the plurality of regions which retain the liquid lubricant in the plurality of regions during operation of the device. An electroactive phase comes in contact with at least the portion of the interior surface. The liquid lubricant impregnated surface introduces a slip at the surface when the electroactive phase flows along the surface. The electroactive phase may be a yield stress fluid.

A cement including: an alkali silicate; an organic silicate; a compound selected from a group consisting of Pozzolanic compounds and synthetic Pozzolanic substitutes; a metal oxide; an activator.

A process for making a cement, the cement containing a naturally occurring silicate bound in an organic binder, and a metal oxide. An example process includes dissolving the organic binder at least in part, using an effective amount of a chemical activator. An example process also includes providing the silicate to react with other components of the cement. An example process also includes providing the silicate to participate in crystal growth. An example process also includes providing the silicate so that the cement is a structural load bearing cement.

A method for modifying environmental conditions comprises deploying a material having an albedo of at least 0.15 over a surface of a body of water associated with a man-made structure. The deployed material increases an albedo of the surface, increases an evaporation rate at the surface for a given temperature, and decreases a temperature characterizing the man-made structure.

The disclosure relates to using a single chamber for multiple treatments resulting in a semiconductor chip having an interconnect. An exemplary process many include forming a via to expose several layers of a microchip. The layers may include, pattered dielectric layer, a capping layer, a first metal layer and an insulator. A surface modification step is then implemented to modify and / or densify the treated surfaces of the dielectric surface. A metal compound removal step is then implemented to remove metal compounds from the bottom of the via. Finally, the via is filled with a conductive material. The surface modification and the metal compound removal steps are implemented in one chamber.