The invention relates to a low-Al
refractory high-entropy
alloy system for catalyzing
thermal growth of an alpha-Al2O3 oxidation film through Si. The low-Al
refractory high-entropy
alloy system is composed of six elements which can be expressed as (TaMoCrR) 100-xSixAl5-10 (R = W, Nb, Hf, V, Zr and Ti) according to the arrangement of element melting points from high to low, the content of Al in the
alloy is 5-10 at%, the content of Si is correspondingly adjusted in the range of 45-25 at%, the balance is Ta, Mo, Cr and R, the content of the four elements is close to the equal
atomic ratio, and the alloy mixed entropy is larger than 1.5 R. The
refractory high-entropy alloy is composed of a high-Al FCC
solid solution phase and two low-Al hexagonal structure
silicide phases Rm5Si3 (Rm = TaMoCrRAl), one of the low-Al hexagonal structure
silicide phases is the Rm5Si3 phase according with the stoichiometric ratio of 5: 3, and the other of the low-Al hexagonal structure
silicide phases is the Rm5Si3 phase with insufficient Si. The refractory high-entropy alloy
system prepared through the method can thermally grow a single alpha-Al2O3 oxidation film with protection in dry air at the temperature of 1300-1500 DEG C and in the environment containing water and
oxygen, the alpha-Al2O3 film is still well combined with a base body after circulating oxidation is conducted for 20 h at the temperature of 1400 DEG C, and the
cracking phenomenon is avoided.