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Photoresist removing method of superconductive quantum bit air bridges and chip

A technology of superconducting quantum and air bridge, which is applied in the field of superconducting quantum, can solve the problems of poor glue removal effect and long time of glue removal process, etc.

Pending Publication Date: 2021-06-22
INST OF PHYSICS - CHINESE ACAD OF SCI
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0008] 1. The degumming process takes a long time;
[0009] 2. Poor degumming effect

Method used

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  • Photoresist removing method of superconductive quantum bit air bridges and chip
  • Photoresist removing method of superconductive quantum bit air bridges and chip
  • Photoresist removing method of superconductive quantum bit air bridges and chip

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0045] This example is used to illustrate the degumming method of the present invention.

[0046] The method of the present invention is applicable to superconducting qubits including air bridges in which superconducting qubits are niobium-based or aluminum-based superconducting qubit chips, and niobium-based superconducting qubit chips are used in the following embodiments.

[0047] Step 1: Fix the niobium-based superconducting qubit chip with the air bridge prepared on a well-grounded clip.

[0048] The preparation method of the air bridge is as follows:

[0049] 1. Spin coating SPR 220 3.0, the rotation speed is 4000rpm, and the time is 60s;

[0050]2. Bake on a hot plate at 115°C for 1 min;

[0051] 3. Use laser direct writing to expose the window where the second layer of aluminum is connected to the first layer of aluminum;

[0052] 4. Bake on a hot plate at 115°C for 1 min;

[0053] 5. Use ZX238 (purchased from Suzhou Yancai Micro-Nano Technology Co., Ltd.) to devel...

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PUM

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Abstract

The invention provides a photoresist removing method for superconductive quantum bit air bridges. The method comprises the step of spraying photoresist on multiple superconductive quantum bit air bridges by using a mixed solution of acetone and N-methyl pyrrolidone. According to the method disclosed by the invention, the photoresist in the superconductive quantum bit air bridge process is successfully removed, and the problems existing in photoresist removal by an original soaking method are solved. Tests show that the performance of the multi-quantum bit obtained by applying the process disclosed by the invention reaches the corresponding level in the world.

Description

technical field [0001] The invention belongs to the field of superconducting quantum, and in particular relates to a glue removal method for a superconducting qubit air bridge and a chip thereof. Background technique [0002] Superconducting qubits are based on a nonlinear resonant circuit composed of a capacitor and the nonlinear inductance of a Josephson junction. A good balance has been achieved in terms of qubit lifetime, scalability, ease of manipulation, and ease of processing. It is recognized as the most likely solution to realize a universal quantum computer. [0003] Therefore, superconducting quantum computing has become one of the key areas of competition among major scientific and technological countries in the world. my country has also listed quantum computing as a major scientific research direction at the national strategic level. As the core superconducting quantum chip of superconducting quantum computing, it can be said that its preparation process and ...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B82Y10/00B82B3/00
CPCB82Y10/00B82B3/00
Inventor 宿非凡杨钊华田野赵士平
Owner INST OF PHYSICS - CHINESE ACAD OF SCI