Alkali throwing cleaning equipment with circulation filtering function and using method thereof

Abstract

The invention discloses an alkali throwing cleaning device with a circulation filtering function and a method for using the same, and belongs to the field of silicon wafer cleaning; an alkali throwing cleaning device with a circulation filtering function includes a tilting mechanism, a box body, a reciprocating drive mechanism, and a breaking mechanism And the cleaning mechanism; by setting the tilting mechanism to tilt the box, the liquid in the box can flow to the storage box, and complete the filtration and recycling; the reciprocating drive mechanism is used to control the back and forth movement of the silicon wafer in the two stations of alkali throwing and cleaning, The silicon wafer can be cleaned every time after alkali polishing, avoiding the accumulation of impurities on the surface of the silicon wafer and not affecting the effect of alkali polishing; by setting a breaking mechanism, the floc colloid on the surface of the silicon wafer can be broken before washing Dispersion, which is convenient for the cleaning mechanism to wash away the flocculent colloid; a method of using the alkali throwing cleaning equipment with a circulation filtering function includes clamping adjustment, inclination adjustment, flushing angle adjustment and alkali throwing cleaning.

Description

technical field [0001] The disclosure belongs to the field of silicon wafer cleaning, and in particular relates to an alkali polishing cleaning device with a circulation filtering function and a usage method thereof. Background technique [0002] The core of solar cell technology has always been to reduce costs and improve efficiency. On the one hand, the texturing process can extend the optical path of light on the silicon surface, and on the other hand, it can reduce reflection losses, thereby improving efficiency. , the reflectivity is 11%, and the reflectivity of polysilicon wafers is 16% after acid texture treatment commonly used at present. As a new texturing technology, it is rapidly being applied on a large scale. This method catalyzes the etching rate of the contact point with the silicon wafer by metal ions to form deep pits on the surface of the silicon wafer, thereby increasing the specific surface area and forming a light-trapping structure. Reduce reflectivity...

AI Technical Summary

Problems solved by technology

[0004] In view of the deficiencies in the prior art, the purpose of the present disclosure is to provide an alkali polishing cleaning device with a circulation filtering function and its use method, which solves the problem in the prior art that the quality of alkali polishing is affected by the impurities on the surface of silicon wafers

Images