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Selective contact area buried solar cell and back contact structure thereof

A technology of solar cells and back contacts, which is applied in the field of solar cells, can solve problems such as high requirements for groove width control and poor passivation effect, and achieve high requirements for groove width control, loose width control requirements, and reduced leakage current Effect

Pending Publication Date: 2021-08-24
ZHEJIANG AIKO SOLAR ENERGY TECH CO LTD
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0005] The purpose of the embodiments of the present invention is to provide a back contact structure of a solar cell, aiming to solve the existing problems of high requirements for groove width control and poor passivation effect

Method used

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  • Selective contact area buried solar cell and back contact structure thereof
  • Selective contact area buried solar cell and back contact structure thereof
  • Selective contact area buried solar cell and back contact structure thereof

Examples

Experimental program
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Effect test

Embodiment 1

[0085] The first embodiment of the present invention provides a back contact structure of a solar cell. For the convenience of description, only the parts related to the embodiment of the present invention are shown. Refer to Figure 1-Figure 13 As shown, the back contact structure of the solar cell provided by the embodiment of the present invention includes:

[0086] Grooves arranged at intervals on the back side of the silicon substrate 10;

[0087] Alternately arranged first conductive regions 20 and second conductive regions 30, one of which is arranged in the groove, and the other is arranged outside the groove, the first conductive region 20 includes the first dielectric layer 21 and the second conductive region arranged in sequence a doped region 22, the second conductive region 30 includes the second doped region;

[0088] A second dielectric layer 40 disposed between the first conductive region 20 and the second conductive region 30, the second dielectric layer 40 i...

Embodiment 2

[0131] The second embodiment of the present invention provides a selective contact area buried solar cell. For the convenience of description, only the parts related to the embodiment of the present invention are shown. Refer to Figure 1-Figure 13 As shown, the selective contact area buried solar cell provided by the embodiment of the present invention includes:

[0132] silicon substrate 10;

[0133] The back contact structure described in the foregoing embodiments on the back side of the silicon substrate 10; and

[0134] The third dielectric layer 70 is disposed on the front surface of the silicon substrate 10 .

[0135] Further, in one embodiment of the present invention, the second dielectric layer 40 and the third dielectric layer 70 can be prepared by preparing the front and back sides of the silicon substrate 10 respectively through the same process, and at this time, the third dielectric layer 70 can be The structure is the same as that of the second dielectric lay...

Embodiment 3

[0142] The third embodiment of the present invention provides a method for fabricating a selective contact region buried solar cell. For the convenience of description, only the parts related to the embodiment of the present invention are shown. Refer to Figure 14 As shown, the selective contact region buried solar cell manufacturing method provided in the embodiment of the present invention is used to prepare the selective contact region buried solar cell as described in the foregoing embodiments. Specifically, the method includes:

[0143] Step S11, creating a plurality of grooves arranged at intervals on the back surface of the silicon substrate;

[0144] Wherein, before step S11, it should also include preprocessing the silicon substrate;

[0145] The above pretreatment includes cleaning the silicon substrate and removing the damaged layer. Specifically, including:

[0146] (1) RCA standard cleaning, remove particles and organic matter on the surface of the silicon subs...

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Abstract

The invention is suitable for the technical field of solar cells, and provides a selective contact area buried solar cell and a back contact structure thereof. The back contact structure comprises grooves arranged on the back of a silicon substrate at intervals; a first conductive region and a second conductive region alternately arranged, one of the first conductive region and the second conductive region being arranged in the groove, the other of the first conductive region and the second conductive region being arranged outside the groove, the first conductive region comprising a first dielectric layer and a first doped region which are sequentially arranged, and the second conductive region comprising a second doped region; a second dielectric layer arranged between the first conductive region and the second conductive region, and the number of the second dielectric layer being at least one; and a conductive layer disposed on the first conductive region and the second conductive region. According to the back contact structure provided by the invention, the problems of high control requirement on the width of the groove and poor passivation effect in the prior art are solved.

Description

technical field [0001] The invention belongs to the technical field of solar cells, in particular to a selective contact region buried solar cell and its back contact structure. Background technique [0002] In crystalline silicon solar cells, the efficiency loss of the cell can be divided into two aspects: electrical loss and optical loss. Shielding of surface metal grid lines. [0003] Among them, the passivated metal contact structure has remarkable electrical properties, and can obtain low contact resistivity and low surface recombination at the same time. This structure consists of an ultra-thin tunnel oxide layer and N-type doped or P-type doped polysilicon layer. . Since the light absorption of the doped polysilicon layer is a "parasitic" absorption, that is, it does not contribute to the photo-generated current, so the passivated metal contact structure is mostly used on the back of the cell, so that the front surface can completely avoid the shielding of the metal...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L31/0224H01L31/0216H01L31/0352H01L31/056H01L31/068H01L31/18
CPCH01L31/022441H01L31/02167H01L31/02168H01L31/035272H01L31/056H01L31/0682H01L31/1804H01L31/1868Y02E10/547Y02E10/52H01L31/0747H01L31/035281H01L31/02363H01L31/028
Inventor 邱开富王永谦杨新强陈刚
Owner ZHEJIANG AIKO SOLAR ENERGY TECH CO LTD
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