Unlock instant, AI-driven research and patent intelligence for your innovation.

Mark position setting method and device

A technology for marking positions and setting methods, applied in design optimization/simulation, special data processing applications, geometric CAD, etc., can solve the problems of poor accuracy and high cost, and achieve the effect of reducing production costs and improving accuracy

Active Publication Date: 2021-09-17
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
View PDF3 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0004] This application provides a marking position setting method and device, which are used to alleviate the technical problems of high cost and poor accuracy in the current method of manually designing mask marks

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Mark position setting method and device
  • Mark position setting method and device
  • Mark position setting method and device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0055] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings in the embodiments of the present application. Obviously, the described embodiments are only a part of the embodiments of the present application, but not all of the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the protection scope of the present application.

[0056] An embodiment of the present application provides a method and device for setting a mark position, the method for setting a mark position includes: acquiring a position parameter of a film forming area; determining a first candidate mark area on a preset substrate according to the position parameter of the film forming area ; Obtain occupant position parameters; determine a second candidate marker area in the first candidate marker area...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a mark position setting method and device, and the mark position setting method comprises the steps: determining a first candidate mark region on a preset substrate according to the position parameter of a film forming region, determining a second candidate mark region in the first candidate mark region according to the position parameter of an occupant, determining a mark position parameter in the second candidate mark area based on the coordinate constraint parameter, and determining a set position of the mark according to the mark position parameter. According to the invention, the candidate marking area is determined according to the film forming area position parameter and the occupant position parameter, and the mark setting position is determined in the candidate marking area according to the coordinate constraint parameter, so that the method is convenient for automatically setting the marking position, is beneficial to improving the accuracy of designing the mask plate mark, and is beneficial to reducing the production cost.

Description

technical field [0001] The present application relates to the field of automation design, and in particular, to a method and device for setting a mark position. Background technique [0002] The mask is an indispensable tool in the production process of electronic devices such as display panels. Using the mask to expose or perform vapor positioning deposition is an important means in the process of manufacturing the display panel. During the use of the mask, it needs to be positioned by a variety of marks. At present, the method of designing mask plate marking is that the designer manually sets the marking position according to the design rules and personal experience. This method has high experience requirements and great dependence on the designer, labor cost and time cost. are higher, and the consistency and accuracy of the design are poor. [0003] Therefore, the current method for manually designing mask marks has technical problems of high cost and poor accuracy. S...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/20G06F30/10G06F111/04
CPCG06F30/20G06F30/10G06F2111/04
Inventor 刘烨凯王梦亚赵鹏程全
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD