Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

High-precision stamping die limiting structure capable of preventing materials from deviating

A stamping die and limit structure technology, applied in the field of stamping dies, can solve the problems of stamping parts offset, stamping parts damage, slowness, etc., and achieve the effect of avoiding shaking

Pending Publication Date: 2021-09-24
方国保
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The existing stamping abrasives are generally fixed by manual limit, making their positioning inaccurate. Due to manual operation errors are prone to occur, which will cause the stamping parts to shift when the stamping die is working, causing damage to the stamping parts. At the same time, this method is more Slow, affecting the efficiency of mass production, so a new type of stamping die is needed to improve the deficiencies of the existing technology

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • High-precision stamping die limiting structure capable of preventing materials from deviating
  • High-precision stamping die limiting structure capable of preventing materials from deviating
  • High-precision stamping die limiting structure capable of preventing materials from deviating

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0062] see Figure 1-Figure 15 As shown, this embodiment provides a high-precision stamping die limit structure for preventing material offset, including a stamping device 200 and a limit mechanism 100 installed inside the stamping device 200. The limit mechanism 100 includes at least:

[0063] Mounting seat 110, the mounting seat 110 is a rectangular plate structure, which is convenient for the installation of various parts on the limit mechanism 100, and plays a supporting role;

[0064] The limit device 120, the limit device 120 includes a movable plate 121, the upper surface of the movable plate 121 is provided with a stamping groove 1210, which is convenient for the deformation and separation of the stamping parts, the movable plate 121 is fixedly connected with the mounting seat 110 by bolts, To facilitate the installation of the limiter 120, the top of the movable plate 121 is connected with a clamping device 122, and there are two clamping devices 122, and the two clam...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of stamping dies, in particular to a high-precision stamping die limiting structure capable of preventing materials from deviating. The high-precision stamping die limiting structure comprises a stamping device and a limiting mechanism installed in the stamping device. In the high-precision stamping die limiting structure capable of preventing the materials from deviating, the clamping device is arranged so that the side face of a stamping part can be conveniently and stably clamped, the stamping part is prevented from deviating, the clamping length can be conveniently adjusted through sliding between a sliding block and a limiting rod, the stamping part can be accurately clamped, after the length is adjusted, the sliding block is automatically reset through the elastic force effect of a sliding rod spring, meanwhile, clamping work of the stamping part is stabilized, a fixing frame is arranged, through the rotation relation of a rotating block and the fixing frame, the fixing frame can conveniently limit and fix the top face of the stamping part, and through an arranged buffer block, and the upper surface of the stamping part can be conveniently fixed before a stamping module makes contact with the stamping part, and shaking of the stamping part is avoided.

Description

technical field [0001] The invention relates to the technical field of stamping dies, in particular to a high-precision stamping die stop structure for preventing material offset. Background technique [0002] Stamping die is a special process equipment for processing metal or non-metallic materials into parts or semi-finished products in cold stamping processing. It is called cold stamping die, commonly known as cold stamping die, and stamping is at room temperature. The mold exerts pressure on the material to cause separation or plastic deformation to obtain a pressure processing method for the required parts. It is formed by stamping with a stamping die. It mainly has the following characteristics: Stamping parts are produced on the premise that the material consumption is not large Next, the parts manufactured by stamping are light in weight and good in rigidity, and after the plastic deformation of the sheet metal, the internal structure of the metal is improved, which ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): B21D43/00
CPCB21D43/003
Inventor 方国保
Owner 方国保
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com