Unlock instant, AI-driven research and patent intelligence for your innovation.

Epitaxial wafer storage and transportation method and device

A technology for transportation devices and epitaxial wafers, which is applied in the directions of transportation and packaging, conveyor objects, object supply, etc., which can solve problems such as unfavorable processing and scattered epitaxial wafers, and achieve the effect of convenient transfer

Active Publication Date: 2021-11-19
JIANGSU HUAXING LASER TECH CO LTD +1
View PDF5 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0003] The invention provides a storage and transportation device for epitaxial wafers, which solves the technical problem in the related art that the epitaxial wafers are scattered on the conveyor belt for transportation, which is not conducive to subsequent processing.

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Epitaxial wafer storage and transportation method and device
  • Epitaxial wafer storage and transportation method and device
  • Epitaxial wafer storage and transportation method and device

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0035] The subject matter described herein will now be discussed with reference to example implementations. It should be understood that the discussion of these implementations is only to enable those skilled in the art to better understand and realize the subject matter described herein, and is not intended to limit the protection scope, applicability or examples set forth in the claims. Changes may be made in the function and arrangement of elements discussed without departing from the scope of the disclosure. Various examples may omit, substitute, or add various procedures or components as needed. Additionally, features described with respect to some examples may also be combined in other examples.

[0036] Such as Figure 1-Figure 9 As shown, a storage and transportation device for epitaxial wafers includes a conveying mechanism and a storage mechanism, wherein the storage mechanism includes a plurality of storage units 101, and the storage units 101 and the storage unit...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention relates to the technical field of semiconductor processing, and discloses an epitaxial wafer storage and transportation device, which comprises a conveying mechanism and a storage mechanism. The storage mechanism comprises a plurality of storage units, the storage units are connected through a connecting belt to form a belt-shaped structure, and the connecting belt is made of a flexible material. Each storage unit comprises a storage base; a storage barrel is arranged on the storage base; an opening is formed in the top of the storage barrel; and a switch unit used for controlling the opening to be opened and closed is arranged on the opening in the top of the storage barrel. The conveying mechanism comprises a rack on which two symmetrically-arranged chains are arranged. Each chain is formed by connecting a plurality of chain links, and the adjacent chain links are rotationally connected through pin shafts. A chain plate of each chain link is provided with a clamp used for clamping the storage mechanism. Epitaxial wafers are stored in order through the storage mechanism, and subsequent processing is facilitated.

Description

technical field [0001] The invention relates to the technical field of semiconductor processing, more specifically, it relates to a storage and transportation device for epitaxial wafers. Background technique [0002] The epitaxial wafers need to be transported during the production process. In the prior art, the epitaxial wafers are scattered on the conveyor belt for transportation, which is not conducive to subsequent processing and transfer. Contents of the invention [0003] The invention provides a storage and transportation device for epitaxial wafers, which solves the technical problem in the related art that the epitaxial wafers are scattered on a conveyor belt for transportation, which is not conducive to subsequent processing. [0004] According to one aspect of the present invention, a storage and transportation device for epitaxial wafers is provided, including a conveying mechanism and a storage mechanism, wherein the storage mechanism includes a plurality of ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/677B65H5/28
CPCH01L21/67706B65H5/28B65H2701/11332
Inventor 徐鹏飞王文知王岩罗帅季海铭
Owner JIANGSU HUAXING LASER TECH CO LTD