Lithography machine parameter state detection method, device, equipment and storage medium thereof

Abstract

The present application discloses a method, device, equipment and storage medium for detecting the parameter state of a lithography machine. The method includes obtaining various working parameters of the lithography machine during operation; converting various working parameters into corresponding working graphical interfaces And quantify; compare the deviation between the working graphical interface and the corresponding normal graphical interface, if the deviation is within the preset range, the lithography machine at work is qualified; if the deviation exceeds the preset range, the lithography machine at work is faulty . The above-mentioned technical solution provided by the present application converts various working parameters of the lithography machine into the corresponding working graphical interface, and judges whether the various parameters of the lithographic machine are abnormal according to the working graphical interface, and compares them more intuitively. The change of the status of various parameters of the equipment solves the problem of low timeliness of the traditional way of relying on engineers to stop inspections and equipment inspections, and at the same time avoids the batch scrapping of products due to untimely tracking of equipment parameter changes.

Description

Method, device, device and storage medium for detecting parameter state of lithography machine technical field The present invention relates to lithography machine technical field, be specifically related to a kind of lithography machine parameter state detection method, device, equipment and its storage medium. Background technique [0002] The lithography machine is one of the key equipment in the production and manufacture of integrated circuits, and the lithography machine is in a continuous working state. Due to environmental influences such as external temperature, humidity and purification degree, and because of the many parts that are linked during work, it is easy to cause a malfunction. A series of failures, such as lost steps, optical path deviation, energy attenuation, etc., will affect the quality of the reticle pattern. [0003] At present, when checking the pattern quality of the lithography machine, it is mainly by tracking the parameter changes of each c...

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Problems solved by technology

[0002] The lithography machine is one of the key equipment in the production and manufacturing process of integrated circuits. In the continuous working state of the lithography machine, due to environmental influences such as external temperature, humidity, and purification degree, and because there are many linked parts during work, it is easy to appear A series of faults such as motor loss, optical path deviation, energy attenuation, etc., will affect the image quality of the reticle

[0003] At present, when checking the graphic quality of the lithography machine, it is mainly by tracking the parameter changes of each component of the equipment or by the engineer to detect each equipment instrument when the machine is shut down. batch scrapping

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