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Magnetic field generating device suitable for vacuum coating equipment

A magnetic field generating device and vacuum coating technology, which are applied in the manufacture/processing of electromagnetic devices, electromagnets, etc., can solve the problems of small uniform magnetic field space and low magnetic field intensity, and achieve the effect of saving horizontal limited space

Active Publication Date: 2021-11-26
BEIHANG UNIV
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, this device occupies a large space in the vacuum equipment, and because the generated magnetic field is elliptical, the uniform magnetic field space generated by it is small, and the magnetic field strength that can be obtained is also low

Method used

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  • Magnetic field generating device suitable for vacuum coating equipment
  • Magnetic field generating device suitable for vacuum coating equipment
  • Magnetic field generating device suitable for vacuum coating equipment

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1

[0035] By simulating the internal structure of the vacuum coating equipment, a wafer 5 with a diameter of 4 inches was placed horizontally in the central area of ​​a pair of spherical slice pole heads (60 cm in height). Among them, the shape of the pole head is cut from a sphere with a diameter of 85cm, which is placed at the center of the wafer. By simulating an external excitation coil power supply, a magnetic field is generated in the central area. The excitation coil is a copper wire with a diameter of 2mm and the number of turns is 400. By applying a current of 10A, a uniform magnetic field is generated in the center area of ​​the pole head.

[0036] Through magnetic field simulation such as Figure 4 It can be obtained that the magnetic field intensity obtained within the 4-inch region is (23.463-26.337) mT, and the uniformity is 89.1%.

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Abstract

The invention discloses a magnetic field generating device suitable for vacuum coating equipment. The magnetic field generating device comprises an annular magnetic circuit, a pair of excitation coils, a pair of iron cores, and a pair of spherical surface pole heads, wherein the annular magnetic circuit adopts a hollow annular structure, so that the sample table can be embedded from the annular magnetic circuit in a non-contact manner; the annular magnetic circuit is specifically in a circular ring shape; the iron cores are vertically placed and can be bent; the pole heads are spherical sections; and the excitation coils are connected with an external power supply to accurately control the generated magnetic field. According to the magnetic field generating device, the transverse limited space in the vacuum coating equipment can be effectively saved; the generated magnetic field intensity can be accurately controlled; a uniformly distributed magnetic field can be generated in a preparation area; the magnetic field generating device is suitable for preparation of large-size wafer film stacks; no adverse effect is generated on other required conditions (such as heating) for preparing the wafer membrane stack; and the preparation of a high-quality magnetic chip membrane stack can be carried out.

Description

technical field [0001] The invention relates to the field of vacuum coating equipment, in particular to a magnetic field generating device suitable for a sample stage of vacuum equipment, which is used to apply a uniform and controllable magnetic field when preparing a magnetic chip. Background technique [0002] As the core unit of highly reliable information storage (such as magnetic random access memory, etc.) and highly sensitive magnetic signal sensing (such as magnetoresistive sensors, etc.), magnetic chips have been widely used in aircraft, satellite control systems, and mobile phone electronic compass, Automobile driving and other fields have become indispensable basic components in information technology and information industry. The functional film layer of the magnetic chip is usually prepared in vacuum equipment. One of the key core technologies in the preparation process is that a high uniformity and controllable magnetic field needs to be applied when the funct...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01F7/06H01L43/12H10N50/01
CPCH01F7/06H10N50/01
Inventor 朱大鹏张学莹赵巍胜
Owner BEIHANG UNIV
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