Quantum dot substrate manufacturing method and quantum dot substrate
A production method and technology of quantum dots, which are applied in the manufacture of semiconductor/solid-state devices, electrical components, and electric solid-state devices, etc., can solve the problems of difficult quantum dot films and low printing accuracy, and achieve efficient preparation, ensure printing accuracy, and achieve high efficiency and high efficiency. Effects of the Resolution Quantum Dot Layer
Pending Publication Date: 2021-12-07
SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD
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[0005] The embodiment of the present application provides a method for manufacturing a quantum dot substrate and a quantum dot substrate, which can solve the technical problem that it is difficult to use inkjet printing technology to prepare a large-area quantum dot film due to low printing accuracy
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[0045] The following will clearly and completely describe the technical solutions in the embodiments of the application with reference to the drawings in the embodiments of the application. Apparently, the described embodiments are only some of the embodiments of the application, not all of them. Based on the embodiments in this application, all other embodiments obtained by those skilled in the art without making creative efforts belong to the scope of protection of this application.
[0046] Embodiments of the present application provide a method for manufacturing a quantum dot substrate and the quantum dot substrate. Each will be described in detail below. It should be noted that the description sequence of the following embodiments is not intended to limit the preferred sequence of the embodiments. In addition, in the description of the present application, the term "including" means "including but not limited to". The terms first, second, third, etc. are used for design...
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Abstract
The embodiment of the invention discloses a manufacturing method of a quantum dot substrate and the quantum dot substrate, and the manufacturing method of the quantum dot substrate comprises the following steps: providing a base material, arranging a deposition groove, a first electrode and a second electrode on the base material, arranging the first electrode at the bottom of the deposition groove, and arranging the first electrode and the second electrode in an insulated manner; adding the quantum dot solution with the quantum dots into a deposition tank; applying a voltage to the first electrode and the second electrode, so an electric field is formed between the first electrode and the second electrode, the quantum dots are deposited on the first electrode through the electric field, and the quantum dot layer is formed on the first electrode. The technical problem that a large-area quantum dot film is difficult to prepare by adopting an ink-jet printing technology due to low printing precision can be solved.
Description
technical field [0001] The present application relates to the field of display technology, in particular to a manufacturing method of a quantum dot substrate and the quantum dot substrate. Background technique [0002] As a new type of nano-fluorescent material, quantum dots (Quantum dots, QD) have a series of unique optical properties such as adjustable spectrum with size, narrow emission peak half-wave width, large Stokes shift, and high excitation efficiency, which can endow Display wider color gamut. [0003] Ink-jet printing (Ink-jet Print, IJP) technology is a widely used and relatively direct technology, which can realize the effective use of materials, form individual pixels and flexible design of printing devices. At present, the biggest challenge encountered by inkjet printing technology is to obtain a single extremely small and stable droplet in the face of high-resolution display, and to form a uniform pixel point after drying. [0004] When inkjet printing tec...
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IPC IPC(8): H01L51/56C25D7/12C25D5/02
CPCC25D5/026C25D7/12H10K71/135H10K71/00
Inventor 石志清赵金阳陈黎暄段淼
Owner SHENZHEN CHINA STAR OPTOELECTRONICS SEMICON DISPLAY TECH CO LTD