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Semiconductor process equipment and exhaust system thereof

A technology of exhaust system and process equipment, which is applied in semiconductor/solid-state device manufacturing, electrical components, circuits, etc. It can solve the problems of inability to realize multi-pressure control requirements and low-pressure control, so as to improve applicability and scope of application , expand the scope of application, improve the effect of process speed

Pending Publication Date: 2022-04-01
BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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  • Abstract
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  • Claims
  • Application Information

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Problems solved by technology

[0003] In view of the shortcomings of the existing methods, this application proposes a semiconductor process equipment and its exhaust system to solve the existing technical problems in the prior art that the control of low pressure cannot be realized, and the technical problem that the demand for multi-pressure control cannot be realized

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  • Semiconductor process equipment and exhaust system thereof
  • Semiconductor process equipment and exhaust system thereof

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Embodiment Construction

[0024] The present application is described in detail below, and examples of embodiments of the present application are shown in the drawings, wherein the same or similar reference numerals denote the same or similar components or components having the same or similar functions throughout. Also, detailed descriptions of known technologies will be omitted if they are not necessary to illustrate the features of the present application. The embodiments described below by referring to the figures are exemplary only for explaining the present application, and are not construed as limiting the present application.

[0025] Those skilled in the art can understand that, unless otherwise defined, all terms (including technical terms and scientific terms) used herein have the same meanings as commonly understood by those of ordinary skill in the art to which this application belongs. It should also be understood that terms, such as those defined in commonly used dictionaries, should be ...

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Abstract

The embodiment of the invention provides semiconductor process equipment and an exhaust system thereof. The exhaust system comprises a switching device, a first pressure control mechanism and a second pressure control mechanism, the switching device is connected with the process chamber, and is connected with the first pressure control mechanism and the second pressure control mechanism; a first pressure control pipeline of the first pressure control mechanism is connected with the switching device and is used for exhausting the process chamber; the first controller is arranged on the first pressure control pipeline and is used for controlling the process chamber to be kept at the first pressure when the first pressure control pipeline exhausts; a second pressure control pipeline of the second pressure control mechanism is connected with the switching device and is used for exhausting the process chamber; the second controller is arranged on the second pressure control pipeline and used for controlling the process chamber to be kept at a second pressure when the second pressure control pipeline exhausts, and the second pressure is larger than the first pressure. According to the embodiment of the invention, the process chamber can be kept in at least two pressure states, so that the applicability and the application range of the embodiment of the invention are improved.

Description

technical field [0001] The present application relates to the technical field of semiconductor processing, and in particular, the present application relates to a semiconductor process equipment and an exhaust system thereof. Background technique [0002] At present, in the semiconductor process equipment, the wafer undergoes process reaction in the process chamber. In order to ensure the uniform and controllable process reaction of the wafer, it is necessary to provide stable pressure. In process practice, pressure control equipment is usually added to the exhaust system of the process chamber to achieve stable pressure control. With the development of process technology, in the current advanced process, it is usually necessary to realize two pressure control modes of normal pressure (absolute pressure 758-760 Torr) and low pressure (absolute pressure 50 Torr) in different steps of a process to achieve different process results. However, the exhaust system in the prior art...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): H01L21/67
CPCH01L21/67Y02P70/50
Inventor 王立卡石磊
Owner BEIJING NAURA MICROELECTRONICS EQUIP CO LTD
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