Method and device for removing pollutants on photoetching equipment
A technology for lithography equipment and pollutants, applied in the field of memory, can solve problems such as inability to determine whether the lithography equipment is polluted, and achieve the effects of reducing losses, improving production efficiency, and saving energy
Pending Publication Date: 2022-04-29
YANGTZE MEMORY TECH CO LTD
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Problems solved by technology
[0004] The main purpose of this application is to provide a method, device, computer-readable storage medium and processor for removing pollutants on lithography equipment, so as to solve the problem that the existing solutions cannot determine whether the lithography equipment is polluted
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[0027] It should be noted that, in the case of no conflict, the embodiments in the present application and the features in the embodiments can be combined with each other. The present application will be described in detail below with reference to the accompanying drawings and embodiments.
[0028] In order to enable those skilled in the art to better understand the solution of the present application, the technical solution in the embodiment of the application will be clearly and completely described below in conjunction with the accompanying drawings in the embodiment of the application. Obviously, the described embodiment is only It is an embodiment of a part of the application, but not all of the embodiments. Based on the embodiments in this application, all other embodiments obtained by persons of ordinary skill in the art without creative efforts shall fall within the scope of protection of this application.
[0029] It should be noted that the terms "first" and "second...
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The invention provides a method and a device for removing pollutants on photoetching equipment. The method comprises the following steps: acquiring the distribution condition of pollutants on the surfaces of a plurality of wafers in a continuous time period in a photoetching process, wherein the distribution condition comprises whether the pollutants exist on the surfaces of the wafers and / or the thicknesses of the pollutants on the surfaces of the wafers; and determining whether the photoetching equipment is polluted at least according to the distribution condition. According to the scheme, whether the photoetching equipment is polluted or not is determined according to the distribution condition of the pollutants on the surfaces of the plurality of wafers in the photoetching process, and the problem that whether the photoetching equipment is polluted or not cannot be determined in the prior art is solved. According to the method, the photoetching equipment is cleaned only under the condition that the photoetching equipment is determined to be polluted, and not only under the condition that one or more wafers are polluted, the photoetching equipment is cleaned, so that the energy is saved, and the production efficiency is improved.
Description
technical field [0001] The present application relates to the field of memory, in particular, to a method, device, computer-readable storage medium and processor for removing pollutants on lithography equipment. Background technique [0002] With the development of 3D NAND technology, its process will become more and more complex, and the processing cycle will become longer and longer. Therefore, the lithography equipment in the lithography process is more vulnerable to the process of the wafer before lithography. Therefore, it is very important to accurately determine whether the lithography equipment is contaminated and when it is contaminated. [0003] Existing solutions can only determine whether the wafer is contaminated, but cannot determine whether the lithography equipment is contaminated. Contents of the invention [0004] The main purpose of the present application is to provide a method, device, computer-readable storage medium and processor for removing pollut...
Claims
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Login to View More IPC IPC(8): G03F7/20
CPCG03F7/70908G03F7/70925
Inventor 潘晓东万星星孙健强
Owner YANGTZE MEMORY TECH CO LTD