Feature size offset error calculation method and device, storage medium and terminal
A technology of characteristic size and offset error, which is applied in the terminal, the method and device for calculating the offset error of characteristic size, and the field of storage media, can solve the problems of long calculation time and low calculation efficiency, and reduce the amount of calculation, reduce the number, The effect of improving computing efficiency
Pending Publication Date: 2022-05-06
全芯智造技术有限公司
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[0004] However, in order to calculate the feature size, a large number of calculations are required. When the number of polygons to be tested is large, the calculation time will become very long and the calculation efficiency will be low.
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[0035] As mentioned in the background art, in order to calculate the feature size, a large number of calculations are required. When the number of polygons to be tested is large, the calculation time will become very long and the calculation efficiency will be low.
[0036] In the technical solution of the present invention, by selecting the first starting point with the largest characteristic size and the second starting point with the smallest characteristic size among multiple starting position points, and using this as the starting point to perform an iterative calculation process, the first starting point with the largest characteristic size is obtained. A target position point and a second target position point with the smallest feature size. Combining the selection of the starting point and the iterative calculation process, it is possible to avoid calculating the feature size for non-starting points and position points that do not meet the iteration conditions, which ca...
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The invention discloses a feature size offset error calculation method and device and a storage medium, and the method comprises the steps: obtaining a to-be-measured position point in a to-be-measured layout, and determining a plurality of initial position points based on the position of the to-be-measured position point; calculating the feature size of each initial position point, and determining a first initial point and a second initial point based on the value of the feature size; performing iteration by using the first starting point and a first iteration criterion to obtain a first target position point; carrying out iteration by using a second starting point and a second iteration criterion to obtain a second target position point; and calculating an offset error of the to-be-measured layout based on the feature size of the first target position point and the feature size of the second target position point. According to the technical scheme, the offset error calculation efficiency can be improved.
Description
technical field [0001] The present invention relates to the field of semiconductor technology, in particular to a method and device for calculating an offset error of a feature size, a storage medium, and a terminal. Background technique [0002] In the calculation process of Optical Proximity Correction (OPC), the sampling of the signal is discrete, and the signal between sampling points needs to be obtained by interpolation algorithm, so the signal value of the polygon edge (polygon edge) is mostly is the result of the interpolation calculation. Among them, the sampling point refers to the position of the rectangular frame used for the simulation calculation of the critical Dimension (CD), which can be represented by the center point of the rectangular frame; the characteristic size of the sampling point refers to the line segment (gauge )length. The range of feature size variation at each sampling point is called shift variance. The offset error is one of the important...
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IPC IPC(8): G01B11/03
CPCG01B11/03
Inventor 不公告发明人
Owner 全芯智造技术有限公司