Agent for inhibiting/ameliorating skin roughness caused by fatigue and/or pressure, and method for screening same

A screening method and improving agent technology, applied in skin care preparations, biochemical equipment and methods, testing pharmaceutical preparations, etc., to achieve the effect of improving rough skin, improving skin problems, restoring or strengthening barrier function

Pending Publication Date: 2022-05-13
SHISEIDO CO LTD
View PDF12 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

However, it has not been fully elucidated so far which substance suppresses the deterioration of the skin condition such as rough skin caused by the increase of cortisol caused by fatigue, stress, for example, by information stimulation, etc. fatigue, stress

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Agent for inhibiting/ameliorating skin roughness caused by fatigue and/or pressure, and method for screening same
  • Agent for inhibiting/ameliorating skin roughness caused by fatigue and/or pressure, and method for screening same
  • Agent for inhibiting/ameliorating skin roughness caused by fatigue and/or pressure, and method for screening same

Examples

Experimental program
Comparison scheme
Effect test

Embodiment

[0089] Next, the present invention will be described in further detail through examples. In addition, the present invention is not limited thereto.

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

The skin roughness inhibiting / ameliorating agent according to the present invention inhibits / ameliorates skin roughness caused by an increase in cortisol due to fatigue and / or stress by enhancing the expression of caspase 14 or inhibiting a decrease in expression. By means of the screening method of the present invention, it is possible to select a substance having an effect of suppressing / ameliorating skin roughness caused by fatigue and / or stress. An agent for inhibiting / ameliorating skin roughness, comprising a camellia extract and / or a flat orange extract, is effective in inhibiting / ameliorating skin roughness caused by fatigue and / or stress by enhancing the expression of caspase 14 or inhibiting the expression reduction.

Description

technical field [0001] The present invention relates to an agent for suppressing / improving skin roughness caused by fatigue and / or stress and a screening method thereof. Background technique [0002] Mental / physical damage due to stress is well known. From a cosmetic point of view, it is known that stress impairs the moisture retention function and barrier function of the skin, causes dryness of the skin, disorder of texture, skin problems such as acne, eczema, atopic dermatitis, and allergic dermatitis, and skin diseases ( Patent Documents 1 to 3). In addition, it is known that when the pressure overlap occurs, the working efficiency is reduced, that is, the fatigued state (Non-Patent Document 1). [0003] The current lifestyle is full of various information stimulations via sight / hearing, etc., and it is thought that such stimulation may cause stress and fatigue. However, the effects of fatigue and stress on the skin caused by such information stimulation have not been ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Applications(China)
IPC IPC(8): A61K8/9789A61K36/752A61K36/82A61P17/00A61P43/00A61Q19/00C12Q1/37G01N33/15
CPCA61K8/9789A61K36/752A61K36/82A61P17/00A61P43/00A61Q19/00C12Q1/37G01N33/15
Inventor 丰田美乡土师信一郎宫井雅史光村麻衣子远藤瞳白土真纪
Owner SHISEIDO CO LTD
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products