Unlock instant, AI-driven research and patent intelligence for your innovation.

Vertical transistor

A vertical transistor, grain technology, applied in semiconductor devices, nanotechnology for materials and surface science, electrical components, etc., can solve problems such as volatile memory dissipation

Pending Publication Date: 2022-06-14
MICRON TECH INC
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

Volatile memory dissipates and thus gets refreshed / rewritten to maintain data storage

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Vertical transistor
  • Vertical transistor
  • Vertical transistor

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0012] figure 1 An example vertical transistor 14 as part of construction 10 is shown in accordance with an embodiment of the present invention. Construction 10 includes base substrate 11 having any one or more of conductive / conductor / conductive, semiconductive / semiconductor / semiconductor, or insulating / insulator / insulating (ie, herein electrically) material(s) 12 . Various materials have been formed vertically over the base substrate 11 . Materials are available at figure 1 Next to, vertically inside, or vertically outside of the material depicted. For example, other partially or fully fabricated components of the integrated circuit system may be disposed somewhere above, around, or within the base substrate 11 . Only one vertical transistor 14 is shown, but configuration 10 may include multiple vertical transistors of the same or different configurations, eg fabricated to include an array of multiple vertical transistors in accordance with the present invention.

[0013...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

PropertyMeasurementUnit
Average grain sizeaaaaaaaaaa
Average grain sizeaaaaaaaaaa
Average grain sizeaaaaaaaaaa
Login to View More

Abstract

A vertical transistor includes a top source / drain region, a bottom source / drain region, a channel region vertically between the top and bottom source / drain regions, and a gate operably laterally adjacent to the channel region. The top source / drain region has a top interface with the channel region, and the bottom source / drain region has a bottom interface with the channel region. The channel region is crystalline and its grains have an average grain size of less than 20 nanometers. The channel region at the top interface or the bottom interface has a horizontal texture greater than a volume of the grains in the channel region vertically between the grains at the top and bottom interfaces. Other embodiments and aspects are disclosed.

Description

technical field [0001] Embodiments disclosed herein relate to vertical transistors. Background technique [0002] Memory is a type of integrated circuit system and is used in computer systems to store data. Memory can be fabricated as one or more arrays of individual memory cells. Memory cells may be written or read using digit lines (which may also be referred to as bit lines, data lines, or sense lines) and access lines (which may also be referred to as word lines). Sense lines can conductively interconnect memory cells along columns of the array, and access lines can conductively interconnect memory cells along rows of the array. Each memory cell is uniquely addressable by a combination of sense and access lines. [0003] Memory cells may be volatile, semi-volatile or non-volatile. Non-volatile memory cells can store data for extended periods of time in the absence of power. Non-volatile memory is conventionally designated as memory with a retention time of at least ...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
IPC IPC(8): H01L29/78H01L29/10H01L29/04B82Y30/00B82Y10/00
CPCH01L29/7827H01L29/7831H01L29/04H01L29/1037B82Y10/00B82Y30/00H01L29/78642H01L29/7869
Inventor 李宜芳刘鸿威陆宁A·A·卡恩德卡尔J·B·赫尔S·博尔萨里
Owner MICRON TECH INC
Features
  • R&D
  • Intellectual Property
  • Life Sciences
  • Materials
  • Tech Scout
Why Patsnap Eureka
  • Unparalleled Data Quality
  • Higher Quality Content
  • 60% Fewer Hallucinations
Social media
Patsnap Eureka Blog
Learn More