Damping system, substrate processing apparatus including damping system, and substrate processing method
A technology of substrate processing device and damping system, which is applied to cocks including cutting devices, valve devices, control/adjustment systems, etc., can solve the problems of excessive fog, high exhaust volume, unevenness, etc., and achieves cost reduction, Improve yield and achieve response effects
Pending Publication Date: 2022-06-17
DMS CO LTD
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Problems solved by technology
[0004] If the exhaust volume is relatively high, there is a problem of watermarking on the surface of the substrate during the evaporation of the liquid on the surface of the substrate
In addition, when the exhaust volume is relatively low, too much mist will be generated, and unevenness (Mura) may occur due to the water condensation phenomenon caused by this mist.
[0005] In addition, when the expansion and modification of the substrate processing equipment, if the exhaust volume is insufficient throughout the process, the fluctuation of the exhaust volume (hunting) will occur, and there is a problem that the yield of the finished product will decrease due to this.
Method used
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[0053] Hereinafter, description will be made with reference to the accompanying drawings of preferred embodiments of the present invention that can specifically realize the above-mentioned problems to be solved. In the description of the present embodiment, the same names and the same reference numerals are used for the same structures, and additional descriptions thereof are omitted.
[0054] figure 1 is an illustration showing a damping system according to an embodiment of the present invention, figure 2 Yes figure 1 A cross-sectional illustration of the damping system.
[0055] refer to figure 1 and figure 2 , the damping system 100 according to the present embodiment may include a housing 110 , a shaft member 120 , a regulating plate 130 , a pressure sensor, a driving part 150 , a control part, and a control box 160 .
[0056] The housing 110 may have a flow path 111 through which the gas passes. The housing 110 may be coupled to the exhaust pipe in the form of a f...
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The invention provides a damping system which monitors the pressure difference of gas in real time, automatically adjusts the gas displacement when the pressure difference exceeds a set pressure difference range, and can perform rapid manual adjustment in an emergency. And a substrate processing apparatus and a substrate processing method capable of automatically controlling the pressure difference in the process chamber in real time and improving the stability of the process environment and the yield of finished products. To this end, the damping system according to the present invention comprises: a housing having a flow path through which gas passes; a shaft member rotatably coupled to the housing; an adjustment plate provided on the flow path and coupled to the shaft member to adjust the opening degree of the flow path; a pressure sensor measuring a pressure difference between the first exhaust pressure and the second exhaust pressure; a drive unit that rotates the shaft member; and a control unit that controls the drive unit such that a pressure difference between the first exhaust pressure and the second exhaust pressure coincides with a preset reference pressure difference.
Description
technical field [0001] The present invention relates to a damping system, a substrate processing device including the damping system, and a substrate processing method, and in particular to a method that can monitor the pressure difference of gas passing through an exhaust pipe in real time, so that when the pressure difference exceeds a set pressure difference A damping system that automatically adjusts the exhaust volume during range and enables rapid manual adjustment in the event of an emergency, and a damping system that automatically controls the pressure difference inside the process chamber in real time by using the damping system in the substrate manufacturing process to improve the process A substrate processing apparatus and a substrate processing method for environmental stability and product yield. Background technique [0002] Semiconductors or display devices are manufactured by performing processes for forming various units such as films, patterns, metal wiri...
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IPC IPC(8): H01L21/67G05D27/02
CPCH01L21/67017H01L21/67034H01L21/67253G05D27/02G01F1/34F16K5/103
Inventor 朴庸硕赵才衍
Owner DMS CO LTD