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Cu-doped hydrotalcite-based photocatalytic material as well as preparation method and application thereof

A photocatalytic material and technology of catalytic material, applied in the field of photocatalyst, can solve the problems of low energy utilization rate, low surface adsorption rate, waste, etc., achieve strong photochemical stability, improve photocatalytic performance, and solve the effect of difficult recovery

Pending Publication Date: 2022-06-24
ZHEJIANG UNIV OF TECH
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

However, in practical applications, researchers have found that traditional photocatalytic materials have a low utilization rate of energy in the visible region of sunlight, and nearly 95% of the energy is wasted during irradiation. At the same time, traditional photocatalytic materials have small specific surface area, low surface adsorption rate, Difficulty in recycling can easily cause secondary pollution and other problems

Method used

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  • Cu-doped hydrotalcite-based photocatalytic material as well as preparation method and application thereof
  • Cu-doped hydrotalcite-based photocatalytic material as well as preparation method and application thereof
  • Cu-doped hydrotalcite-based photocatalytic material as well as preparation method and application thereof

Examples

Experimental program
Comparison scheme
Effect test

Embodiment 1-3

[0026] 1) Prepare Cu(NO) whose molar ratios of copper, magnesium and aluminum are 1:2:1, 1.5:1.5:1 and 2:1:1 3 ) 2 , Mg(NO 3 ) 2 ·6H 2 O and Al (NO 3 ) 3 ·9H 2 A solution of O in 200mL each;

[0027] 2) Preparation of NaOH:Na 2 CO 3 Three 200mL portions of 2:1 B solution;

[0028] 3) Using the double-drop co-precipitation method, pour the solution A in step 1) and the solution B in step 2) into six constant pressure dropping funnels, respectively, and place them in three wells with 100 mL of deionized water respectively. Put the three-necked round-bottomed flask on the magnetic stirrer at both ends of the round-bottomed flask, and keep the pH value between 9.5 and 10.0. After the dropwise addition, continue stirring for 30 minutes to obtain a blue gelatinous precipitate, which is placed in the Crystallized at 60 °C for 24 h in an oven, then washed with water, filtered, dried, crushed, and passed through a 100-mesh sieve to obtain blue powders, which are respectively ...

Embodiment 4

[0030] Shimadzu XRD-6000 X-ray powder diffractometer was used, and the characterization parameters were set as follows: Cu target, K α ray, λ is 0.1542 nm, the angle range is 5°~80°, and the crystal structures of the samples from Example 1 to Example 3 are determined. from figure 1 It can be seen from the XRD spectrum that the baseline is stable, the characteristic peak of (003) crystal plane is narrow and sharp, and the diffraction peaks of (003), (006), (009), (110) unique to hydrotalcite are all clear and not accompanied by impurity peaks, which indicates that the prepared material has high crystallinity and good regularity. figure 1 The 2θ corresponding to (003), (006), and (009) are: 11.4°, 23.52°, and 34.8°, respectively. According to the Bragg formula (nλ=2dsinθ), the layer spacing of Example 1-Example 3 is calculated to be 7.6092 , 7.6092, 7.6884, where Cu 2 The interlayer spacing of MgAl-LDHs is about 7.6884 nm. Comparing the interlayer spacing of the three sample...

Embodiment 5

[0032] Get each 2000mg of the photocatalytic material prepared by the method of Example 1-3, scan the wavelength range of 200~800nm ​​in an ultraviolet-visible spectrophotometer (2550 type, Shimadzu), and measure the diffuse reflection spectrum of hydrotalcite, such as figure 2As shown, in the visible light region, the three CuMgAl-LDHs have a certain degree of absorption in the 560-700 nm band, and are effective in the visible light region. According to the simplified Kubelka-Munk formula E=1240 / λeV, Cu 1 Mg 2 Al-LDHs, Cu 1.5 Mg 1.5 Al-LDHs, Cu 2 The forbidden band widths of MgAl-LDHs are: 3.21eV, 3.13eV, 3.05eV, Cu 2 MgAl-LDHs has a lower band gap than the other two samples, and the wavelength range of the required excitation light source is large.

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Abstract

The invention discloses a Cu-doped hydrotalcite-based photocatalytic material and a preparation method and application thereof, the Cu-doped hydrotalcite-based photocatalytic material takes Cu metal ions as a main body and hydrotalcite as a carrier, the chemical general formula of the Cu-doped hydrotalcite-based photocatalytic material is [Cu < 2 + > nMg < 2 + > Al (OH) 3] LDHs, n is the molar ratio of Cu < 2 + > to [Mg < 2 + >], and n is the molar ratio of Cu < 2 + > to [Mg < 2 + >]. The double-hydroxyl composite hydroxide of the copper-magnesium-aluminum ternary hydrotalcite is used for catalytically degrading rhodamine B in dye wastewater, the reaction condition is mild, the dye removal rate is high, and the catalytically degraded material is easy to recycle.

Description

technical field [0001] The invention relates to the technical field of photocatalysts, in particular to a Cu-doped hydrotalcite-based photocatalytic material and a preparation method and application thereof. Background technique [0002] In the heterogeneous photocatalytic reaction, when the semiconductor material is irradiated by light with energy greater than its forbidden band width, electron-hole pairs are generated and react with the substances adsorbed on the surface of the material. Most of the semiconductor materials used as photocatalysts have appropriate band gaps, and traditional photocatalytic materials such as TiO 2 and ZnO, etc., have good photocatalytic properties, can use the light source to generate strong oxidizing electron-hole pairs, and use the electron-hole pairs to photocatalyze the dye molecules adsorbed on the surface of the catalyst, and so on to achieve The purpose of degrading dyes. However, in practical applications, researchers found that trad...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): B01J23/72B01J27/232B01J35/00C02F1/30C02F101/30
CPCB01J27/232B01J23/007B01J23/78C02F1/30C02F2305/10C02F2101/308B01J35/39
Inventor 夏盛杰林孝鑫薛继龙
Owner ZHEJIANG UNIV OF TECH
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