Preparation device and preparation method of pixel definition layer

Abstract

The invention provides a preparation device and method of a pixel definition layer, and the device comprises a conveying unit which is used for conveying a substrate, and the substrate comprises a pixel definition layer light resistor which is located at one side, away from the conveying unit, of the substrate; and the imprint mold is arranged on one side, deviating from the conveying unit, of the substrate, and is used for imprint of the pixel definition layer photoresist to obtain a groove corresponding to a pixel opening. By adopting the preparation device provided by the embodiment of the invention and implementing the preparation method provided by the embodiment of the invention, the required pixel definition layer can be prepared on the substrate only through four technological processes of coating, imprinting, curing and etching; compared with the prior art in which a plurality of manufacturing technological processes of coating, curing, exposure, developing and etching are needed, and precise exposure equipment and a precise mask plate are needed, the manufacturing method has the advantages that the equipment and material cost in the preparation process of the pixel definition layer is saved, and the production efficiency of the pixel definition layer is improved.

Description

technical field [0001] The present application relates to the field of display, and in particular, to a preparation device and preparation method of a pixel definition layer. Background technique [0002] Organic Electroluminescence Display (OLED) and Quantum Dot Light Emitting Diodes (QLED) displays are fabricated by solution printing technology, which have the advantages of low cost, high productivity, and easy realization of large size, which is the future development of display technology. important direction. In the printing process, the pixel-defining layer is very important for the printing yield of the display material and the uniformity of the later film formation. [0003] At present, the manufacturing process of the pixel definition layer is to first coat the pixel definition layer material, then expose and develop through a mask, and finally etch to obtain the required pixel definition layer structure. This manufacturing process requires sophisticated exposure e...

AI Technical Summary

Problems solved by technology

[0003] At present, the manufacturing process of the pixel definition layer is to first coat the material of the pixel definition layer, then expose and develop it through a mask plate, and finally perform etching to obtain the required pixel definition layer structure. This manufacturing process requires sophisticated exposure equipment and sophisticated Mask plate production increases manufacturing costs, and requires multiple manufacturing processes of coating, curing, exposure, development, and etching, reducing production efficiency

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