Vacuum purification furnace of high-purity aluminum for preparing semiconductor chip

Abstract

The high-purity aluminum vacuum purification furnace comprises a vacuum purification furnace body, four sets of supporting rods are arranged at the bottom of the outer side of the vacuum purification furnace body, and a containing plate is arranged at the bottom of the side, away from the vacuum purification furnace body, of the set of supporting rods on the same side; through mutual cooperation of a limiting bolt, an internal thread sleeve block, a limiting sliding groove, an internal thread sleeve, a servo motor, a rotating rod, a thread, an L-shaped sliding rod, an annular sliding groove, a sealing cover, a vacuum purification furnace, a sleeve block, a limiting rod, a second limiting resisting rod, a first limiting resisting rod and a stirring rod, the sealing cover can be opened and closed; the rotating stirring work of the stirring rod can be achieved, so that the automatic opening and closing function is achieved, the opening and closing steps of operators are reduced, meanwhile, the melting efficiency of the vacuum purification furnace can be improved, the waiting time of the operators is shortened, and therefore the using convenience and practicability of the vacuum purification furnace can be improved.

Description

technical field [0001] The invention relates to the technical field of vacuum purification furnaces, in particular to a vacuum purification furnace for preparing high-purity aluminum of semiconductor chips. Background technique [0002] In the process of aluminum purification, the purification furnace is used as a necessary equipment. The user adds the raw material refined aluminum from solid into the purification furnace, and in the heating environment of the purification furnace, the raw material refined aluminum is melted into liquid. Purification of aluminium; [0003] In the process of using the existing vacuum purification furnace, the following inconveniences will occur: 1. The internal structure of the existing vacuum purification furnace is relatively simple, and most of them can only achieve high-temperature melting and purification of aluminum materials, and this operation method requires expensive operation. There are many working hours for personnel, which redu...

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Problems solved by technology

[0004] The object of the present invention is to provide a vacuum purification furnace for high-purity aluminum used to prepare semiconductor chips, to solve the problems in the use process of the existing vacuum purification furnace in the above-mentioned background technology In the process, the following inconveniences will occur: 1. The internal structure of the existing vacuum purification furnace is relatively simple, and most of them can only realize the high-temperature melting and purification of aluminum materials. This operation method requires more working hours for operators, thereby reducing Its use efficiency is reduced, and the existing vacuum purification furnace needs the operator to manually open the sealing cover before use. This kind of operation method is relatively cumbersome and reduces its practicality; 2. The internal sealing effect is poor, and it is easy to cause vacuum leakage during work, which affects the subsequent purification quality, thus increasing the inconvenience of using the vacuum purification furnace.

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