Looking for breakthrough ideas for innovation challenges? Try Patsnap Eureka!

Method and system for quickly drawing layout

A layout and rapid technology, applied in the fields of instrumentation, calculation, electrical and digital data processing, etc., can solve the problems of high development cost, difficulty in eliminating or correcting, and increasing the complexity of drawing tools, so as to improve accuracy and efficiency. The effect of work efficiency

Pending Publication Date: 2022-07-22
SEMITRONIX
View PDF0 Cites 2 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

The cost of software development is huge, and it is difficult to eliminate or correct it 100%. In addition, some of them increase the complexity of the operation of drawing tools, which is not conducive to the substantial improvement of drawing efficiency

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Method and system for quickly drawing layout
  • Method and system for quickly drawing layout
  • Method and system for quickly drawing layout

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0022] The technical solutions in the specific embodiments of the present invention will be clearly and completely described below. Obviously, the described embodiments are only a part of the embodiments of the present invention, but not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those of ordinary skill in the art without creative efforts shall fall within the protection scope of the present invention.

[0023] The operations of the embodiments are described in the following embodiments in a specific order, the description of which is for a better understanding of the details of the embodiments to provide a comprehensive understanding of the invention, but not to limit the scope of the invention.

[0024] In this embodiment of the present invention, as figure 1 As shown in the figure, the method for quickly drawing a layout includes the following steps: Step 1: Setting an auxiliary layer in the layout. Step 2:...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

PUM

No PUM Login to View More

Abstract

The invention provides a method for quickly drawing a layout. The method comprises the following steps: setting an auxiliary layer in the layout; a plurality of reference patterns are laid in the auxiliary pattern layer, and the intervals of the adjacent reference patterns are equal; the reference graph is a preset regular graph; when a graph is drawn on the target graph layer, automatically acquiring the vertex position of the input graph and adjusting the position to enable the graph to accord with a preset graph rule of the target graph layer; the graph rule of the target graph layer is set based on the reference graph. According to the layout drawing method and the layout drawing device, the drop points which do not conform to the graphic rule of the target layer can be adjusted by setting the auxiliary layer and combining the graphic rule of the preset target layer, layout drawing is visually assisted, then rapid layout drawing is achieved, and the drawing accuracy and the working efficiency are greatly improved. The invention further provides a system for rapidly drawing the layout, and the system has corresponding advantages due to the fact that the method can be executed for drawing.

Description

technical field [0001] The invention belongs to the technical field of semiconductor design and production, and in particular relates to a method for rapidly drawing a layout and a corresponding system for rapidly drawing a layout. Background technique [0002] In the FinFet process, the layout of the FinFet process is still relying solely on manual labor, as well as manual layout inspection and repair, which inevitably affects the efficiency of layout drawing. drawing version Figure 1 Generally, it is manually drawn in the window of the drawing tool, and the landing point is drawn through the mouse input. When drawing the layout, the structure must fall on the FinGrid (Fin grid). Since most of the existing drawing tools rely on manual mouse operations to determine the landing point, often Relying on the user's visual inspection of the drawing window interface to make the landing point by intuitive feeling, it is conceivable that the landing point position is difficult to a...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to View More

Application Information

Patent Timeline
no application Login to View More
Patent Type & Authority Applications(China)
IPC IPC(8): G06F30/392G06F30/31
CPCG06F30/392G06F30/31
Inventor 毛俊
Owner SEMITRONIX
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Patsnap Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Patsnap Eureka Blog
Learn More
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic, Popular Technical Reports.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap|About US| Contact US: help@patsnap.com