Microraster structure

A micro-grating and grating technology, applied in the field of micro-grating structures, can solve problems such as poor actuation stability and poor synchronization

Inactive Publication Date: 2006-09-06
中国台湾格雷蒙股份有限公司
View PDF0 Cites 0 Cited by
  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

AI Technical Summary

Problems solved by technology

[0021] The object of the present invention is to propose a micro-grating structure, which is actuated by a double torsion bar, so as to not only improve the unstable actuation stability of the micro-grating actuated by a single torsion bar in the prior art. The problem of good and poor synchronization, and achieve the consistency of the grating mirror surface during operation, so as to improve the effect of optical reflection and diffraction

Method used

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
View more

Image

Smart Image Click on the blue labels to locate them in the text.
Viewing Examples
Smart Image
  • Microraster structure
  • Microraster structure
  • Microraster structure

Examples

Experimental program
Comparison scheme
Effect test

Embodiment Construction

[0065] see Figure 6 , which is a top view of a preferred implementation of a micro-grating structure in the present invention. The micro-grating structure is composed of a semiconductor substrate 61, multiple pairs of structural pillars (wherein each pair of structural pillars is composed of a first structural pillar 62 and a second structural pillar 63), a plurality of gratings 64, a plurality of gaps 65, a first A support portion 66 and a second support portion 67 are formed, wherein the grating 64 also has a first torsion bar 641 , a second torsion bar 642 , a third torsion bar 643 and a fourth torsion bar 644 . The micro-grating structure is made of silicon as the material of the semiconductor substrate 61, and a plurality of gratings 64 are arranged between the first structural pillar 62 and the second structural pillar 63 of each pair of structural pillars, wherein each grating 64 is Adjacent to each other with a gap 65 less than 2 μm wide, and each grating 64 is conne...

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

PUM

No PUM Login to view more

Abstract

A micrograting consists of a base plate, the first support and the second support, the first structure column and the second structure column set in between two supports on the base plate and a grating set in between two columns and having four torque force rods. The first and the second torque force rods are connected to the first and the second supports separately as the third and the fourth torque forced rods are connected to the first and the second structure columns separately, the turning is generated for grating by utilizing static electricity to drive four torque force rods so grating is tilted to be an angle to the base plate.

Description

(1) Technical field [0001] The invention relates to a micro-grating structure, especially a blazing micro-grating structure actuated by double torsion bars. (2) Background technology [0002] (a) Digital micromirror element [0003] Digital Micromirror Device (Digital Micromirror Device, DMD) was developed by Texas Instruments (TI), which integrates micromechanical structures and complementary metal oxide semiconductor (CMOS) circuits with semiconductor manufacturing processes and microelectromechanical technology. , can effectively control the actuation of a single micromirror in a transistor address manner. The actuation method of the digital micromirror element is electrostatic force. When the voltage is actuated, the mirror surface will be tilted about 10° left and right. This feature is used in projection displays and various optical switch related components. It is a masterpiece of MEMS components and is currently a successful commercial product. It has been 15 year...

Claims

the structure of the environmentally friendly knitted fabric provided by the present invention; figure 2 Flow chart of the yarn wrapping machine for environmentally friendly knitted fabrics and storage devices; image 3 Is the parameter map of the yarn covering machine
Login to view more

Application Information

Patent Timeline
no application Login to view more
Patent Type & Authority Patents(China)
IPC IPC(8): G02B5/18G02B26/08
Inventor 黄荣山郭耀辉
Owner 中国台湾格雷蒙股份有限公司
Who we serve
  • R&D Engineer
  • R&D Manager
  • IP Professional
Why Eureka
  • Industry Leading Data Capabilities
  • Powerful AI technology
  • Patent DNA Extraction
Social media
Try Eureka
PatSnap group products

Browse by: Latest US Patents, China's latest patents, Technical Efficacy Thesaurus, Application Domain, Technology Topic.

© 2024 PatSnap. All rights reserved.Legal|Privacy policy|Modern Slavery Act Transparency Statement|Sitemap