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Defect inspector and method thereof

A technology for defect inspection and defect location, which is applied in the direction of measuring devices, optical testing of defects/defects, and material analysis through optical means. It can solve problems such as waste, low photographic sensitivity, and complicated adjustment operations, and achieve the effect of correct judgment.

Inactive Publication Date: 2003-01-29
RICOH KK
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  • Summary
  • Abstract
  • Description
  • Claims
  • Application Information

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Problems solved by technology

[0004] However, according to the above-mentioned prior art example 1, since the criteria for judging whether the uneven defect and the uneven-shade defect are acceptable or not are different, in an optical system that does not distinguish between the two types of defects for imaging, only defects with stricter criteria can be used. The pass / fail judgment is carried out, so that the products that should be good products may be discarded as non-conforming products, or the non-conforming products judged by the defect inspection device are re-inspected by the inspector
In addition, although the structure is simple, it has the advantage of easy adjustment of the optical system. However, if it is desired to increase the imaging sensitivity of one of the concave-convex defects and the uneven-shade defects, there is a problem that the imaging sensitivity of the other is low.
[0005] According to the above-mentioned prior art examples 2 and 3, although the imaging sensitivity of both the concave-convex defect and the uneven-shade defect can be improved by using several light sources or several CCD cameras, due to the fact that the imaging is performed several times, there is a problem of inspection. long time problem
In addition, if several CCD cameras or light sources are installed relative to one light source or CCD camera, there is a problem of complicated adjustment work.

Method used

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Examples

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Embodiment Construction

[0042] Embodiments of the present invention will be described in detail below with reference to the accompanying drawings.

[0043] The defect inspection device of the present invention includes a first optical system, a second optical system and a computing device. The above-mentioned first optical system is provided with a first light source that irradiates light coaxially on the surface of the object to be inspected and receives light from the object to be inspected. The regular reflection light is converted into the first imaging means of the first electrical signal. The above-mentioned second optical system is provided with a second light source that obliquely irradiates the light on the object to be inspected and receives scattered light from the object to be inspected. It is converted into the second imaging means of the second electrical signal. The computing device compares the first electrical signal from the first imaging means with the preset first threshold value t...

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Abstract

The invention efficiently inspects an uneven-shaped defect and an uneven- concentration defect to reduce a loss caused by excessive inspection. This defect inspecting device of the present invention has the first optical system including the first light source 6 for emitting light toward a surface of an inspected specimen at coaxial falling radiation, and the first image picking-up means 10 for receiving regular reflection light from the inspected specimen to be converted into the first electric signal, the second optical system including the second light source 11 for emitting light toward the inspected specimen at diagonal illumination, and the second image picking-up means 13 for receiving scattered light from the inspected specimen to be converted into and the second electric signal, and a computing means 14 for comparing the first electric signal from the first image picking-up means with the first preset threshold value to detect the uneven-shaped defect on the surface of the inspected specimen, and for comparing the second electric signal from the second image picking-up means with the second preset threshold value to detect the uneven-concentration-of-color defect of the inspected specimen.

Description

technical field [0001] The present invention relates to a defect inspection device and method thereof, and more particularly, to a defect inspection device and method thereof for inspecting the surface of an electrophotographic photoreceptor used in copiers, printers, facsimile machines, and the like. Background technique [0002] The surface of electrophotographic photoreceptors used in copiers, printers, facsimiles, etc. may have defects such as damage, foreign matter, and uneven coating during the manufacturing process. As a method of inspecting such defects, visual inspection is generally performed by inspectors. examine. However, in the visual inspection, variations and the like may occur due to individual differences among inspectors, and therefore, various automatic inspection methods and inspection devices have been proposed instead of the above-mentioned visual inspection. [0003] For example, an inspection device disclosed in JP-A-9-325120 (...

Claims

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Application Information

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Patent Type & Authority Applications(China)
IPC IPC(8): G01N21/88G01N21/89G01N21/952G03G21/00
CPCG01N21/8901G01N21/952G01N21/88
Inventor 石浦资昭宫崎邦彦一藤克己
Owner RICOH KK