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118results about How to "Ensure proper implementation" patented technology

Multi-function micro speaker

The present invention relates to a multi-functional subminiature speaker, more particularly, to a bone conduction speaker, which can generate vibration for bone conduction, bodily sensation of vibration, speaker attachment, and the vibration mode over the housing unit, that is, over a front protector of the speaker, a housing, and an outer side of a rear cover, without any projections, and which has an acoustic portion unit further detachably mounted. According to the multi-functional subminiature speaker of the present invention, it is possible to perform the bone conduction without the projections because the vibration can be generated over the whole surface of the multi-functional subminiature speaker, that is, over the whole outer side of the housing unit, by constructing such that loss of the magnetic force transmitted to the vibration coil is minimized by disposing the magnets on both inner and outer sides with respect to the vibration coil, the vibration force has been improved by making the vibration weight unit to be constructed of the yoke, the central and external magnets, and the inner and outer top plates integrally by means of the rivet shaft to thereby increase the weight of the vibration weight, and the corrugated cross-type vibration spring is provided that is adapted to generate the vibration over the whole housing unit in such a manner as to vibrate the vibration weight of the increased weight effectively and to generate vibration in the upward and downward directions as well as in the right and left directions. Also, it is possible to implement the bone conduction of wide-band region by providing the multi-functional subminiature speaker as described above, and it is possible to provide the multi-functional subminiature speaker capable of performing the bone conduction of subminiature security mode, bodily sensation of vibration, speaker attachment, and vibration mode with low manufacturing cost.
Owner:SHIN KWANGSHIK +1

Two tickets combined inference billing method of power grid based on work task analysis

The invention relates to a two tickets combined inference billing method of power grid based on work task analysis, characterized by comprising the steps of a work ticket billing task analysis, a formatted operation task, a work ticket inference and an operation ticket inference, wherein, the work ticket billing task analysis is responsible for extracting required work task content, work equipment, work place, work time and obtaining a required state b for operating on XX equipment from the inputted task; the formatted operation task is responsible for acquiring a current state a of the work equipment from a power grid topology real-time knowledge base, and sending the operation task with a format of switching the XX equipment from state a to state b to an operation inference engine; the work ticket inference is responsible for integrating a work ticket with a normative format through a personnel arrangement sub inference, a safety precautions sub inference and a dangerous point sub inference separately in accordance with the analyzed task; and the operation ticket inference is responsible for billing an operation ticket focused on the operation sequence through an operation task analysis, an operation sequence inference and an operation sequence evaluation. The method is scientific and reasonable, has the advantages of convenience, speediness, nicety, suitability, etc., and realizes the intelligent management of the electric power scheduling.
Owner:NORTHEAST DIANLI UNIVERSITY

Soil organic carbon predication method based on geographically weighted regression

The invention relates to a soil organic carbon predication method based on geographically weighted regression. The soil organic carbon predication method contains a multicollinearity diagnosis technology and a comprehensive processing method in local regression. The main method comprises the following steps: (a) integrating a pre-processing technology for independent variables in global regression and local regression predication methods; (b) performing comprehensive diagnosis and processing mechanism on the collinearity problem of the independent variables in the universal geographically weighted regression; (c) carrying out applicability analysis on the geographically weighted regression method in a specific data set; (d) selecting the optimal independent variable set by adopting a method; and (e) comprehensively considering the spatial trends of the residual errors of the different regression methods. The calculation efficiency and accuracy of spatial attribute predication are improved by the comprehensive consideration for the spatial trends of the residual errors through contrastive analysis for the different independent variable sets and the collinearity degrees of the different independent variable sets in the local regression.
Owner:INST OF SOIL SCI CHINESE ACAD OF SCI

Method for forming a trench in a layer or a layer stack on a semiconductor wafer

Preferably using a positive resist, a resist ridge (20) is formed in a photosensitive resist (16) applied on a semiconductor wafer (1) above a hard mask layer (12). The resist ridge (20) serves as a mask for a subsequent implantation step (46). This makes use of an effect whereby the material of the hard mask layer (12), in a part (122) shaded by the resist ridge (20), can be etched out selectively with respect to the implanted part (121). The consequently patterned hard mask layer is used as an etching mask with respect to an underlying layer or layer stack (102-104) that is actually to be patterned. From the resist ridge (10) that has been formed as a line in the photosensitive resist (16), in a type of tone reversal, an opening (24) has been formed in the hard mask layer and a trench (26) has been formed in the layer/layer stack (102-104). According to the invention, the width (51, 52) of the resist ridge (20) is reduced by exposing the resist ridge (20) to an oxygen plasma (42). As a result, it is possible to form a trench (26) in the hard mask layer (12) and in the layer/layer stack (102-104) the width (52) of which trench is smaller than the lithographic resolution limit during the lithographic patterning of the resist (16).
Owner:POLARIS INNOVATIONS
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