Display and its manufacturing method
A display device, a technology for displaying colors, applied in identification devices, semiconductor/solid-state device manufacturing, optics, etc., and can solve problems such as complex manufacturing processes
Inactive Publication Date: 2003-11-19
SONY CORP
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- Application Information
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Problems solved by technology
However, a special process needs to be introduced in order to create many microscopic reliefs on the planarizing film, which complicates the fabrication process.
Method used
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[0024] First, refer to figure 1 The overall structure of a color display device is briefly described to clarify the background of the present invention. figure 1 The display device has a so-called panel structure, which is made by disposing a pair of glass substrates 100, 135 and sandwiching an electro-optic substance 130 between the two substrates. exist figure 1 Among them, a counter electrode 131 , a plane layer 132 , a color filter 133 and a black matrix 134 are formed on an upper glass substrate 135 .
[0025] On the other hand, a pixel array section 120 and a driving circuit section 130 are disposed on the lower glass substrate 100 . The driving circuit section 130 is located at the periphery relative to the pixel array section 120 . The pixel array section 120 includes each pixel electrode 111 and each thin film transistor (TFT-PXL) for switching / driving the pixel electrode 111 . Each thin film transistor TFT-PXL has a double-gate type bottom-gate structure, and is ...
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Abstract
An active matrix type display device is realized by integrally forming pixel electrodes and switching thin film transistors. The display device has a panel structure formed by a pair of substrates (1), (2) bonded to each other with a predetermined gap separating them and a liquid crystal layer (3) held in the gap between the pair of substrates. A set of thin film transistors (4), a planarizing film (5) covering said thin film transistors and a set of pixel electrodes arranged on the planarizing film (5) are formed on one of the substrates (1), whereas an opposite electrode is formed vis-a-vis the set of pixel electrodes on the other substrate (2). The planarizing film (5) of the display device is made of a photosensitive material and formed to show a varying thickness in the first substrate (1) by means of an exposure process. The parts of the planarizing film (5) that correspond to the pixel electrodes have a thickness that is made to vary according to the wavelength of the display colour assigned to each of the pixel electrodes.
Description
technical field [0001] The invention relates to a display device and a manufacturing method of the display device. More particularly, the present invention relates to an improvement to the planarization technique that is being used to mask the many undulations caused by thin film transistors and their lead wires during the fabrication of an active matrix display device , which includes pixel electrodes and switching thin film transistors as its constituent parts, so that the pixel electrodes are formed on the planarized surface. Background technique [0002] Existing various display devices generally have a so-called panel structure, by disposing a pair of substrates separated by a predetermined gap, and connecting them to each other with an electro-optic substance such as liquid crystal sandwiched in the gap. made by bonding. A group of thin film transistors is formed on one of the two substrates and covered by a planarization film, a group of pixel electrodes is arranged...
Claims
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IPC IPC(8): G02F1/1335G02F1/1333G02F1/1343G02F1/1362G02F1/1368G09F9/30H01L21/336H01L29/786
CPCG02F1/133371G02F1/133553G02F2001/133388G02F1/136227G02F2001/133357G02F1/133357G02F1/133388G02F1/136
Inventor 田中勉
Owner SONY CORP